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Plasma-based carbon ion implantation of aluminium at different process times in a pulse-ignited methane plasma

Baba, Koumei and Hatada, Ruriko and Flege, Stefan and Kraft, Gunther and Ensinger, Wolfgang (2009):
Plasma-based carbon ion implantation of aluminium at different process times in a pulse-ignited methane plasma.
In: Surface and Coatings Technology, Elsevier Science Publishing Company, pp. 2617-2619, 203, (17-18), ISSN 02578972,
[Online-Edition: http://dx.doi.org/10.1016/j.surfcoat.2009.02.077],
[Article]

Abstract

It is well known that aluminium is quite resistant against aqueous corrosion, but suffers from poor tribological properties. A possible solution is the formation of a hard carbide film or deposition of a film of diamond-like carbon. Plasma-based ion implantation with hydrocarbon gases is a method to achieve this, with the particular advantage that this process can be carried out at a low process temperature. Aluminium foil was subjected to plasma-based ion implantation in a methane plasma at a voltage of − 20 kV at process times between 0.5 and 2 h. The particular feature of this experiment was that no external plasma excitation source, such as DC or RF, was applied. The plasma was ignited by the high voltage pulse itself. Glancing incidence X-ray diffraction showed small broad peaks of the carbide phase indicating that the implanted carbon reacted with aluminium to carbide grains of small size. Secondary ion mass spectrometry and X-ray photoelectron spectrometry gave depth profiles of the implanted carbon. The chemical shift of both Al and C photoelectrons proved bond formation.

Item Type: Article
Erschienen: 2009
Creators: Baba, Koumei and Hatada, Ruriko and Flege, Stefan and Kraft, Gunther and Ensinger, Wolfgang
Title: Plasma-based carbon ion implantation of aluminium at different process times in a pulse-ignited methane plasma
Language: English
Abstract:

It is well known that aluminium is quite resistant against aqueous corrosion, but suffers from poor tribological properties. A possible solution is the formation of a hard carbide film or deposition of a film of diamond-like carbon. Plasma-based ion implantation with hydrocarbon gases is a method to achieve this, with the particular advantage that this process can be carried out at a low process temperature. Aluminium foil was subjected to plasma-based ion implantation in a methane plasma at a voltage of − 20 kV at process times between 0.5 and 2 h. The particular feature of this experiment was that no external plasma excitation source, such as DC or RF, was applied. The plasma was ignited by the high voltage pulse itself. Glancing incidence X-ray diffraction showed small broad peaks of the carbide phase indicating that the implanted carbon reacted with aluminium to carbide grains of small size. Secondary ion mass spectrometry and X-ray photoelectron spectrometry gave depth profiles of the implanted carbon. The chemical shift of both Al and C photoelectrons proved bond formation.

Journal or Publication Title: Surface and Coatings Technology
Volume: 203
Number: 17-18
Publisher: Elsevier Science Publishing Company
Uncontrolled Keywords: Aluminium; Aluminium carbide; Methane plasma; Plasma based ion implantation; Secondary ion mass spectroscopy
Divisions: 11 Department of Materials and Earth Sciences > Material Science > Material Analytics
11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences
Date Deposited: 06 Jul 2009 13:49
Official URL: http://dx.doi.org/10.1016/j.surfcoat.2009.02.077
Identification Number: doi:10.1016/j.surfcoat.2009.02.077
Funders: This work was supported by Deutsche Forschungsgemeinschaft (DFG) within the project EN207/19-1.
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