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Plasma-based carbon ion implantation of aluminium at different process times in a pulse-ignited methane plasma

Baba, Koumei ; Hatada, Ruriko ; Flege, Stefan ; Kraft, Gunther ; Ensinger, Wolfgang :
Plasma-based carbon ion implantation of aluminium at different process times in a pulse-ignited methane plasma.
[Online-Edition: http://dx.doi.org/10.1016/j.surfcoat.2009.02.077]
In: Surface and Coatings Technology, 203 (17-18) pp. 2617-2619. ISSN 02578972
[Artikel], (2009)

Offizielle URL: http://dx.doi.org/10.1016/j.surfcoat.2009.02.077

Kurzbeschreibung (Abstract)

It is well known that aluminium is quite resistant against aqueous corrosion, but suffers from poor tribological properties. A possible solution is the formation of a hard carbide film or deposition of a film of diamond-like carbon. Plasma-based ion implantation with hydrocarbon gases is a method to achieve this, with the particular advantage that this process can be carried out at a low process temperature. Aluminium foil was subjected to plasma-based ion implantation in a methane plasma at a voltage of − 20 kV at process times between 0.5 and 2 h. The particular feature of this experiment was that no external plasma excitation source, such as DC or RF, was applied. The plasma was ignited by the high voltage pulse itself. Glancing incidence X-ray diffraction showed small broad peaks of the carbide phase indicating that the implanted carbon reacted with aluminium to carbide grains of small size. Secondary ion mass spectrometry and X-ray photoelectron spectrometry gave depth profiles of the implanted carbon. The chemical shift of both Al and C photoelectrons proved bond formation.

Typ des Eintrags: Artikel
Erschienen: 2009
Autor(en): Baba, Koumei ; Hatada, Ruriko ; Flege, Stefan ; Kraft, Gunther ; Ensinger, Wolfgang
Titel: Plasma-based carbon ion implantation of aluminium at different process times in a pulse-ignited methane plasma
Sprache: Englisch
Kurzbeschreibung (Abstract):

It is well known that aluminium is quite resistant against aqueous corrosion, but suffers from poor tribological properties. A possible solution is the formation of a hard carbide film or deposition of a film of diamond-like carbon. Plasma-based ion implantation with hydrocarbon gases is a method to achieve this, with the particular advantage that this process can be carried out at a low process temperature. Aluminium foil was subjected to plasma-based ion implantation in a methane plasma at a voltage of − 20 kV at process times between 0.5 and 2 h. The particular feature of this experiment was that no external plasma excitation source, such as DC or RF, was applied. The plasma was ignited by the high voltage pulse itself. Glancing incidence X-ray diffraction showed small broad peaks of the carbide phase indicating that the implanted carbon reacted with aluminium to carbide grains of small size. Secondary ion mass spectrometry and X-ray photoelectron spectrometry gave depth profiles of the implanted carbon. The chemical shift of both Al and C photoelectrons proved bond formation.

Titel der Zeitschrift, Zeitung oder Schriftenreihe: Surface and Coatings Technology
Band: 203
(Heft-)Nummer: 17-18
Verlag: Elsevier Science Publishing Company
Freie Schlagworte: Aluminium; Aluminium carbide; Methane plasma; Plasma based ion implantation; Secondary ion mass spectroscopy
Fachbereich(e)/-gebiet(e): Fachbereich Material- und Geowissenschaften > Materialwissenschaften > Materialanalytik
Fachbereich Material- und Geowissenschaften > Materialwissenschaften
Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 06 Jul 2009 13:49
Offizielle URL: http://dx.doi.org/10.1016/j.surfcoat.2009.02.077
ID-Nummer: 10.1016/j.surfcoat.2009.02.077
Sponsoren: This work was supported by Deutsche Forschungsgemeinschaft (DFG) within the project EN207/19-1.
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