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Distribution of carbon in polycrystalline copper surfaces treated by methane plasma immersion ion implantation

Flege, Stefan ; Kraft, Gunther ; Baba, Koumei ; Hatada, Ruriko ; Ensinger, Wolfgang (2009)
Distribution of carbon in polycrystalline copper surfaces treated by methane plasma immersion ion implantation.
In: Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, 267 (8-9)
doi: 10.1016/j.nimb.2009.01.126
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

Copper substrates with rather large grains (dimensions of some mm) treated by pulsed methane plasma immersion ion implantation exhibit a laterally inhomogeneous carbon distribution. Areas with high carbon X-ray intensity in electron probe microanalysis coincide with thicker carbon containing layers as seen in sputter depth profiling via secondary ion mass spectrometry. The distribution of carbon within the surface depends not only on the treatment time and pulse repetition rate but also on the orientation of the individual copper grains.

Typ des Eintrags: Artikel
Erschienen: 2009
Autor(en): Flege, Stefan ; Kraft, Gunther ; Baba, Koumei ; Hatada, Ruriko ; Ensinger, Wolfgang
Art des Eintrags: Bibliographie
Titel: Distribution of carbon in polycrystalline copper surfaces treated by methane plasma immersion ion implantation
Sprache: Englisch
Publikationsjahr: 1 Mai 2009
Verlag: Elsevier Science Publishing Company
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
Jahrgang/Volume einer Zeitschrift: 267
(Heft-)Nummer: 8-9
DOI: 10.1016/j.nimb.2009.01.126
Kurzbeschreibung (Abstract):

Copper substrates with rather large grains (dimensions of some mm) treated by pulsed methane plasma immersion ion implantation exhibit a laterally inhomogeneous carbon distribution. Areas with high carbon X-ray intensity in electron probe microanalysis coincide with thicker carbon containing layers as seen in sputter depth profiling via secondary ion mass spectrometry. The distribution of carbon within the surface depends not only on the treatment time and pulse repetition rate but also on the orientation of the individual copper grains.

Freie Schlagworte: Plasma immersion ion implantation; SIMS; EPMA
Zusätzliche Informationen:

Proceedings of the 16th International Conference on Ion Beam Modification of Materials

Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 29 Jun 2009 14:35
Letzte Änderung: 05 Mär 2013 09:20
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