Flege, Stefan ; Kraft, Gunther ; Baba, Koumei ; Hatada, Ruriko ; Ensinger, Wolfgang (2009)
Distribution of carbon in polycrystalline copper surfaces treated by methane plasma immersion ion implantation.
In: Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, 267 (8-9)
doi: 10.1016/j.nimb.2009.01.126
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Copper substrates with rather large grains (dimensions of some mm) treated by pulsed methane plasma immersion ion implantation exhibit a laterally inhomogeneous carbon distribution. Areas with high carbon X-ray intensity in electron probe microanalysis coincide with thicker carbon containing layers as seen in sputter depth profiling via secondary ion mass spectrometry. The distribution of carbon within the surface depends not only on the treatment time and pulse repetition rate but also on the orientation of the individual copper grains.
Typ des Eintrags: | Artikel |
---|---|
Erschienen: | 2009 |
Autor(en): | Flege, Stefan ; Kraft, Gunther ; Baba, Koumei ; Hatada, Ruriko ; Ensinger, Wolfgang |
Art des Eintrags: | Bibliographie |
Titel: | Distribution of carbon in polycrystalline copper surfaces treated by methane plasma immersion ion implantation |
Sprache: | Englisch |
Publikationsjahr: | 1 Mai 2009 |
Verlag: | Elsevier Science Publishing Company |
Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms |
Jahrgang/Volume einer Zeitschrift: | 267 |
(Heft-)Nummer: | 8-9 |
DOI: | 10.1016/j.nimb.2009.01.126 |
Kurzbeschreibung (Abstract): | Copper substrates with rather large grains (dimensions of some mm) treated by pulsed methane plasma immersion ion implantation exhibit a laterally inhomogeneous carbon distribution. Areas with high carbon X-ray intensity in electron probe microanalysis coincide with thicker carbon containing layers as seen in sputter depth profiling via secondary ion mass spectrometry. The distribution of carbon within the surface depends not only on the treatment time and pulse repetition rate but also on the orientation of the individual copper grains. |
Freie Schlagworte: | Plasma immersion ion implantation; SIMS; EPMA |
Zusätzliche Informationen: | Proceedings of the 16th International Conference on Ion Beam Modification of Materials |
Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften |
Hinterlegungsdatum: | 29 Jun 2009 14:35 |
Letzte Änderung: | 05 Mär 2013 09:20 |
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