TU Darmstadt / ULB / TUbiblio

Formation of thin carbide films of titanium and tantalum by methane plasma immersion ion implantation

Baba, Koumei ; Hatada, Ruriko ; Flege, Stefan ; Kraft, Gunther ; Ensinger, Wolfgang :
Formation of thin carbide films of titanium and tantalum by methane plasma immersion ion implantation.
In: Nuclear Instruments and Methods in Physics Research Section B, 257 (1-2) pp. 746-749.
[Artikel], (2007)

Kurzbeschreibung (Abstract)

Titanium and tantalum samples were treated by high voltage pulses at −20 kV in an atmosphere of methane. The high voltage created a plasma, from which ions of methane and its fragments were accelerated towards the sample and were implanted. Process times between 0.5 and 2 h at a pulse repetition rate of 1 kHz were used. The gas pressure was 1 Pa.

X-ray diffraction results from the near-surface region of the implanted sample showed small peaks of the carbide phases next to dominant peaks of the metal target. Secondary ion mass spectrometry and X-ray photoelectron spectroscopy gave concentration versus depth profiles of the implanted carbon. The chemical shift proved that metal–carbon bonds had been formed. The profiles showed a thin carbon film on top, followed by a shallow implantation profile. The amount of implanted carbon increased with the process time.

Typ des Eintrags: Artikel
Erschienen: 2007
Autor(en): Baba, Koumei ; Hatada, Ruriko ; Flege, Stefan ; Kraft, Gunther ; Ensinger, Wolfgang
Titel: Formation of thin carbide films of titanium and tantalum by methane plasma immersion ion implantation
Sprache: Englisch
Kurzbeschreibung (Abstract):

Titanium and tantalum samples were treated by high voltage pulses at −20 kV in an atmosphere of methane. The high voltage created a plasma, from which ions of methane and its fragments were accelerated towards the sample and were implanted. Process times between 0.5 and 2 h at a pulse repetition rate of 1 kHz were used. The gas pressure was 1 Pa.

X-ray diffraction results from the near-surface region of the implanted sample showed small peaks of the carbide phases next to dominant peaks of the metal target. Secondary ion mass spectrometry and X-ray photoelectron spectroscopy gave concentration versus depth profiles of the implanted carbon. The chemical shift proved that metal–carbon bonds had been formed. The profiles showed a thin carbon film on top, followed by a shallow implantation profile. The amount of implanted carbon increased with the process time.

Titel der Zeitschrift, Zeitung oder Schriftenreihe: Nuclear Instruments and Methods in Physics Research Section B
Band: 257
(Heft-)Nummer: 1-2
Verlag: Elsevier
Freie Schlagworte: 52.77.−j; 52.77.Dq; 81.05.Je; 81.15.−z
Fachbereich(e)/-gebiet(e): Fachbereich Material- und Geowissenschaften > Materialwissenschaften > Materialanalytik
Fachbereich Material- und Geowissenschaften > Materialwissenschaften
Fachbereich Material- und Geowissenschaften
Hinterlegungsdatum: 20 Nov 2008 08:28
Zusätzliche Informationen:

Ion Beam Modification of Materials — Proceedings of the 15th International Conference on Ion Beam Modification of Materials

15th International Conference on Ion Beam Modification of Materials

Sponsoren: The authors would like to thank the Deutsche Forschungsgemeinschaft (DFG) for financial support with the project EN207/19-1.
Export:

Optionen (nur für Redakteure)

Eintrag anzeigen Eintrag anzeigen