Guan, Jingyi ; Li, Daxin ; Duan, Wenjiu ; Yang, Zhihua ; Jia, Dechang ; Riedel, Ralf ; Zhou, Yu (2024)
Comparative study on the oxidation behavior of Si2BC3N/Ta4HfC5 ceramics at 1000 °C and 1500 °C: microstructural evolution and kinetics consideration.
In: Journal of the European Ceramic Society, 44 (10)
doi: 10.1016/j.jeurceramsoc.2024.03.020
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
The oxidation kinetics and oxide scale morphology of the Si2BC3N/Ta4HfC5 ceramics sintered by hot-pressing were explored at 1000 degrees C and 1500 degrees C in flowing air. Dense Si2BC3N/Ta4HfC5 ceramic sintered at 1900 degrees C with fine grain sizes shows the optimal oxidation resistance both at 1000 degrees C and 1500 degrees C. When oxidized at 1000 degrees C, the formation of a porous oxide layer of Ta2O5, Hf(6)Ta(2)O(17 )and HfO2 containing amorphous SiO2 are primarily responsible for the unsatisfying oxidation resistance of the composite. A highly oxidation resistance component like Si2BC3N can promote the oxidation resistance of Ta4HfC5 at 1500 degrees C, thanks to the formation of a dense and continuous tantalum-hafnium silicate glass. The oxidation kinetic curve at 1500 degrees C can be described by a parabolic law whilst the oxidation process is controlled by the diffusion rate of oxygen through the oxide layer; however, the oxidation reaction rate governs the oxidation progress at 1000 degrees C via a linear oxidation kinetics.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2024 |
| Autor(en): | Guan, Jingyi ; Li, Daxin ; Duan, Wenjiu ; Yang, Zhihua ; Jia, Dechang ; Riedel, Ralf ; Zhou, Yu |
| Art des Eintrags: | Bibliographie |
| Titel: | Comparative study on the oxidation behavior of Si2BC3N/Ta4HfC5 ceramics at 1000 °C and 1500 °C: microstructural evolution and kinetics consideration |
| Sprache: | Englisch |
| Publikationsjahr: | August 2024 |
| Verlag: | Elsevier |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Journal of the European Ceramic Society |
| Jahrgang/Volume einer Zeitschrift: | 44 |
| (Heft-)Nummer: | 10 |
| DOI: | 10.1016/j.jeurceramsoc.2024.03.020 |
| Kurzbeschreibung (Abstract): | The oxidation kinetics and oxide scale morphology of the Si2BC3N/Ta4HfC5 ceramics sintered by hot-pressing were explored at 1000 degrees C and 1500 degrees C in flowing air. Dense Si2BC3N/Ta4HfC5 ceramic sintered at 1900 degrees C with fine grain sizes shows the optimal oxidation resistance both at 1000 degrees C and 1500 degrees C. When oxidized at 1000 degrees C, the formation of a porous oxide layer of Ta2O5, Hf(6)Ta(2)O(17 )and HfO2 containing amorphous SiO2 are primarily responsible for the unsatisfying oxidation resistance of the composite. A highly oxidation resistance component like Si2BC3N can promote the oxidation resistance of Ta4HfC5 at 1500 degrees C, thanks to the formation of a dense and continuous tantalum-hafnium silicate glass. The oxidation kinetic curve at 1500 degrees C can be described by a parabolic law whilst the oxidation process is controlled by the diffusion rate of oxygen through the oxide layer; however, the oxidation reaction rate governs the oxidation progress at 1000 degrees C via a linear oxidation kinetics. |
| Freie Schlagworte: | oxidation kinetics, oxidation behavior, Si2BC3N/Ta4HfC5 ceramic, sintering temperature |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Werkstofftechnik und Ressourcenmanagement |
| Hinterlegungsdatum: | 20 Jan 2025 06:49 |
| Letzte Änderung: | 20 Jan 2025 10:31 |
| PPN: | 525422188 |
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