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Effect of sintering temperature on the dielectric properties of 3D‐printed alumina (Al₂O₃) in the W‐band

Jenkel, Kai‐Daniel ; Sánchez‐Pastor, Jesús ; Baloochian, Mohammad Mahdi ; Jakoby, Rolf ; Sakaki, Masoud ; Jiménez‐Sáez, Alejandro ; Benson, Niels (2024)
Effect of sintering temperature on the dielectric properties of 3D‐printed alumina (Al₂O₃) in the W‐band.
In: Journal of the American Ceramic Society, 2024, 107 (4)
doi: 10.26083/tuprints-00027100
Artikel, Zweitveröffentlichung, Verlagsversion

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Kurzbeschreibung (Abstract)

This contribution discusses the impact of sintering temperatures on dielectric properties of 3D‐printed alumina (Al₂O₃) in the W‐band, by evaluating high quality factor (−Q) resonators integrated in a 2D photonic crystal structure. By varying the sintering temperature of the lithography‐based ceramic manufactured (LCM) samples, the microstructure of the material can be defined, which has a direct impact on the dielectric permittivity and material losses. Using a highly accurate photonic crystal structure, with a dimensional variation below 2% from print to print, an accurate extraction and evaluation of the dielectric material properties could be achieved. The relative permittivity of the alumina was tuned from 4.4 at 1250°C to 9.2 at 1650°C, whereas the observed change in dielectric losses was moderate. The maximum in observed dielectric loss for samples sintered at the lowest evaluated temperature, only yields an average value of 30 × 10⁻⁴. This demonstrates the versatility of the LCM technology for mm‐ and sub‐mm‐wave applications and its possibilities for material tuneability.

Typ des Eintrags: Artikel
Erschienen: 2024
Autor(en): Jenkel, Kai‐Daniel ; Sánchez‐Pastor, Jesús ; Baloochian, Mohammad Mahdi ; Jakoby, Rolf ; Sakaki, Masoud ; Jiménez‐Sáez, Alejandro ; Benson, Niels
Art des Eintrags: Zweitveröffentlichung
Titel: Effect of sintering temperature on the dielectric properties of 3D‐printed alumina (Al₂O₃) in the W‐band
Sprache: Englisch
Publikationsjahr: 18 Juni 2024
Ort: Darmstadt
Publikationsdatum der Erstveröffentlichung: 1 Februar 2024
Ort der Erstveröffentlichung: Oxford
Verlag: Wiley-Blackwell
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Journal of the American Ceramic Society
Jahrgang/Volume einer Zeitschrift: 107
(Heft-)Nummer: 4
DOI: 10.26083/tuprints-00027100
URL / URN: https://tuprints.ulb.tu-darmstadt.de/27100
Zugehörige Links:
Herkunft: Zweitveröffentlichung DeepGreen
Kurzbeschreibung (Abstract):

This contribution discusses the impact of sintering temperatures on dielectric properties of 3D‐printed alumina (Al₂O₃) in the W‐band, by evaluating high quality factor (−Q) resonators integrated in a 2D photonic crystal structure. By varying the sintering temperature of the lithography‐based ceramic manufactured (LCM) samples, the microstructure of the material can be defined, which has a direct impact on the dielectric permittivity and material losses. Using a highly accurate photonic crystal structure, with a dimensional variation below 2% from print to print, an accurate extraction and evaluation of the dielectric material properties could be achieved. The relative permittivity of the alumina was tuned from 4.4 at 1250°C to 9.2 at 1650°C, whereas the observed change in dielectric losses was moderate. The maximum in observed dielectric loss for samples sintered at the lowest evaluated temperature, only yields an average value of 30 × 10⁻⁴. This demonstrates the versatility of the LCM technology for mm‐ and sub‐mm‐wave applications and its possibilities for material tuneability.

Freie Schlagworte: additive manufacturing, alumina, dielectric loss, dielectric materials/properties, permittivity, sinter/sintering
Status: Verlagsversion
URN: urn:nbn:de:tuda-tuprints-271003
Sachgruppe der Dewey Dezimalklassifikatin (DDC): 600 Technik, Medizin, angewandte Wissenschaften > 621.3 Elektrotechnik, Elektronik
600 Technik, Medizin, angewandte Wissenschaften > 660 Technische Chemie
Fachbereich(e)/-gebiet(e): 18 Fachbereich Elektrotechnik und Informationstechnik
18 Fachbereich Elektrotechnik und Informationstechnik > Institut für Mikrowellentechnik und Photonik (IMP)
Hinterlegungsdatum: 18 Jun 2024 12:49
Letzte Änderung: 20 Jun 2024 12:25
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