Blume, Raoul ; Calvet, Wolfram ; Ghafari, Aliakbar ; Mayer, Thomas ; Knop‐Gericke, Axel ; Schlögl, Robert (2024)
Structural and Chemical Properties of NiOₓ Thin Films: Oxygen Vacancy Formation in O₂ Atmosphere.
In: ChemPhysChem, 2023, 24 (23)
doi: 10.26083/tuprints-00027228
Artikel, Zweitveröffentlichung, Verlagsversion
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Kurzbeschreibung (Abstract)
NiOₓ films on Si(111) were put in contact with oxygen at elevated temperatures. During heating and cooling in oxygen atmosphere Near Ambient Pressure (NAP)‐XPS and ‐XAS and work function (WF) measurements reveal the creation and replenishing of oxygen vacancies in dependence of temperature. Oxygen vacancies manifest themselves as a distinct O1s feature at 528.9 eV on the low binding energy side of the main NiO peak as well as by a distinct deviation of the Ni2p₃/₂ spectral features from the typical NiO spectra. DFT calculations reveal that the presence of oxygen vacancies leads to a charge redistribution and altered bond lengths of the atoms surrounding the vacancies causing the observed spectral changes. Furthermore, we observed that a broadening of the lowest energy peak in the O K‐edge spectra can be attributed to oxygen vacancies. In the presence of oxygen vacancies, the WF is lowered by 0.1 eV.
| Typ des Eintrags: | Artikel | ||||
|---|---|---|---|---|---|
| Erschienen: | 2024 | ||||
| Autor(en): | Blume, Raoul ; Calvet, Wolfram ; Ghafari, Aliakbar ; Mayer, Thomas ; Knop‐Gericke, Axel ; Schlögl, Robert | ||||
| Art des Eintrags: | Zweitveröffentlichung | ||||
| Titel: | Structural and Chemical Properties of NiOₓ Thin Films: Oxygen Vacancy Formation in O₂ Atmosphere | ||||
| Sprache: | Englisch | ||||
| Publikationsjahr: | 27 Mai 2024 | ||||
| Ort: | Darmstadt | ||||
| Publikationsdatum der Erstveröffentlichung: | 1 Dezember 2023 | ||||
| Ort der Erstveröffentlichung: | Weinheim | ||||
| Verlag: | Wiley-VCH | ||||
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | ChemPhysChem | ||||
| Jahrgang/Volume einer Zeitschrift: | 24 | ||||
| (Heft-)Nummer: | 23 | ||||
| Kollation: | 11 Seiten | ||||
| DOI: | 10.26083/tuprints-00027228 | ||||
| URL / URN: | https://tuprints.ulb.tu-darmstadt.de/27228 | ||||
| Zugehörige Links: | |||||
| Herkunft: | Zweitveröffentlichung DeepGreen | ||||
| Kurzbeschreibung (Abstract): | NiOₓ films on Si(111) were put in contact with oxygen at elevated temperatures. During heating and cooling in oxygen atmosphere Near Ambient Pressure (NAP)‐XPS and ‐XAS and work function (WF) measurements reveal the creation and replenishing of oxygen vacancies in dependence of temperature. Oxygen vacancies manifest themselves as a distinct O1s feature at 528.9 eV on the low binding energy side of the main NiO peak as well as by a distinct deviation of the Ni2p₃/₂ spectral features from the typical NiO spectra. DFT calculations reveal that the presence of oxygen vacancies leads to a charge redistribution and altered bond lengths of the atoms surrounding the vacancies causing the observed spectral changes. Furthermore, we observed that a broadening of the lowest energy peak in the O K‐edge spectra can be attributed to oxygen vacancies. In the presence of oxygen vacancies, the WF is lowered by 0.1 eV. |
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| Freie Schlagworte: | adsorption, nickel, oxide, oxygen, vacancy | ||||
| ID-Nummer: | Artikel-ID: e202300231 | ||||
| Status: | Verlagsversion | ||||
| URN: | urn:nbn:de:tuda-tuprints-272284 | ||||
| Zusätzliche Informationen: | An invited contribution to a Special Collection on Synchrotron-Based Photoand Physical Chemistr |
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| Sachgruppe der Dewey Dezimalklassifikatin (DDC): | 500 Naturwissenschaften und Mathematik > 530 Physik 500 Naturwissenschaften und Mathematik > 540 Chemie |
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| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung |
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| Hinterlegungsdatum: | 27 Mai 2024 13:06 | ||||
| Letzte Änderung: | 28 Mai 2024 06:45 | ||||
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| Suche nach Titel in: | TUfind oder in Google | ||||
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- Structural and Chemical Properties of NiOₓ Thin Films: Oxygen Vacancy Formation in O₂ Atmosphere. (deposited 27 Mai 2024 13:06) [Gegenwärtig angezeigt]
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