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Field effect transistor with electrodeposited ZnO nanowire channel

Florica, Camelia ; Matei, Elena ; Costas, Andreea ; Molares, Maria Eugenia Toimil ; Enculescu, Ionut (2014)
Field effect transistor with electrodeposited ZnO nanowire channel.
In: Electrochimica Acta, 137
doi: 10.1016/j.electacta.2014.05.124
Artikel, Bibliographie

Kurzbeschreibung (Abstract)

In many materials electronic excitations created around the trajectories of swift ions result in defect creation. Experimental observations often yield information on integral damage effects. The presented approach suggests a theoretical model to correlate integral damage results with microscopic effect produced by overlapping of individual single ion tracks. The model is applied to ion-beam induced defects in LiF crystals. Two aspects are treated separately viz. the ion-deposited energy distribution for a given fluence and the material response to the absorbed energy. The first problem is treated within the framework of stochastic superposition of ion tracks, taking into account the radial distribution of the energy transfer of a single ion. For lithium fluoride the creation of color centers is considered as the materials response. The dependence of the defect concentration on the absorbed energy is included in order to obtain the integral defect production.

Typ des Eintrags: Artikel
Erschienen: 2014
Autor(en): Florica, Camelia ; Matei, Elena ; Costas, Andreea ; Molares, Maria Eugenia Toimil ; Enculescu, Ionut
Art des Eintrags: Bibliographie
Titel: Field effect transistor with electrodeposited ZnO nanowire channel
Sprache: Englisch
Publikationsjahr: 1 Mai 2014
Verlag: Elsevier
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Electrochimica Acta
Jahrgang/Volume einer Zeitschrift: 137
DOI: 10.1016/j.electacta.2014.05.124
Kurzbeschreibung (Abstract):

In many materials electronic excitations created around the trajectories of swift ions result in defect creation. Experimental observations often yield information on integral damage effects. The presented approach suggests a theoretical model to correlate integral damage results with microscopic effect produced by overlapping of individual single ion tracks. The model is applied to ion-beam induced defects in LiF crystals. Two aspects are treated separately viz. the ion-deposited energy distribution for a given fluence and the material response to the absorbed energy. The first problem is treated within the framework of stochastic superposition of ion tracks, taking into account the radial distribution of the energy transfer of a single ion. For lithium fluoride the creation of color centers is considered as the materials response. The dependence of the defect concentration on the absorbed energy is included in order to obtain the integral defect production.

Freie Schlagworte: ion irradiation, color centers, defect accumulation, absorbed energy
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Ionenstrahlmodifizierte Materialien
Hinterlegungsdatum: 18 Mär 2024 07:38
Letzte Änderung: 18 Mär 2024 07:38
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