Hadley, A. ; Notthoff, C. ; Mota-Santiago, P. ; Hossain, U. H. ; Mudie, S. ; Toimil-Molares, M. E. ; Trautmann, C. ; Kluth, P. (2018)
Conical etched ion tracks in SiO2 characterised by small angle X-ray scattering.
In: Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, 435
doi: 10.1016/j.nimb.2017.10.020
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
We present a systematic study of the evolution of chemically etched ion tracks formed in thermally grown a-SiO2 after irradiation with 1.1 GeV and 185 MeV Au ions. The irradiated material was subsequently etched with 2.5% hydrofluoric acid (HF) for different times yielding hollow conical shaped structures of various sizes. The characterisation of these structures was carried out by synchrotron-based small-angle X-ray scattering (SAXS) measurements, enabling the determination of the geometry and dimensions of the etched conical structures with sub-nanometre precision. The results indicate that the track etching behavior is influenced by the ion energy, and that at short etching times the latent track damage in the radial direction becomes significant.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2018 |
| Autor(en): | Hadley, A. ; Notthoff, C. ; Mota-Santiago, P. ; Hossain, U. H. ; Mudie, S. ; Toimil-Molares, M. E. ; Trautmann, C. ; Kluth, P. |
| Art des Eintrags: | Bibliographie |
| Titel: | Conical etched ion tracks in SiO2 characterised by small angle X-ray scattering |
| Sprache: | Englisch |
| Publikationsjahr: | 15 November 2018 |
| Verlag: | Elsevier |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms |
| Jahrgang/Volume einer Zeitschrift: | 435 |
| DOI: | 10.1016/j.nimb.2017.10.020 |
| Kurzbeschreibung (Abstract): | We present a systematic study of the evolution of chemically etched ion tracks formed in thermally grown a-SiO2 after irradiation with 1.1 GeV and 185 MeV Au ions. The irradiated material was subsequently etched with 2.5% hydrofluoric acid (HF) for different times yielding hollow conical shaped structures of various sizes. The characterisation of these structures was carried out by synchrotron-based small-angle X-ray scattering (SAXS) measurements, enabling the determination of the geometry and dimensions of the etched conical structures with sub-nanometre precision. The results indicate that the track etching behavior is influenced by the ion energy, and that at short etching times the latent track damage in the radial direction becomes significant. |
| Freie Schlagworte: | ion track, etching, small angle X-ray scattering |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Ionenstrahlmodifizierte Materialien |
| Hinterlegungsdatum: | 07 Mär 2024 07:42 |
| Letzte Änderung: | 07 Mär 2024 07:42 |
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