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Interaction of water with atomic layer deposited titanium dioxide on p‐Si photocathode: modeling of photoelectrochemical interfaces in ultrahigh vacuum with cryo‐photoelectron spectroscopy

Cottre, Thorsten ; Fingerle, Mathias ; Kranz, Melanie ; Mayer, Thomas ; Kaiser, Bernhard ; Jaegermann, Wolfram (2021)
Interaction of water with atomic layer deposited titanium dioxide on p‐Si photocathode: modeling of photoelectrochemical interfaces in ultrahigh vacuum with cryo‐photoelectron spectroscopy.
In: Advanced Materials Interfaces, 8 (11)
doi: 10.1002/admi.202002257
Artikel, Bibliographie

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Kurzbeschreibung (Abstract)

This study combines cryo‐photoelectron spectroscopy and electrochemical analysis techniques to investigate the p‐Si/SiO₂/TiO₂/H₂O system in the context of water‐splitting. Atomic layer deposition is used for the preparation of a TiO₂ thin film coating for a p‐Si/SiO₂ photocathode. First, an interface experiment is performed to study the contact properties of the interface between p‐Si/SiO₂ and TiO₂. For the p‐Si/TiO₂ heterojunction, a downward band bending of 0.3 eV is found for the p‐Si toward the interface. Second, a water adsorption experiment is conducted, which allows the investigation of the surface chemistry of the TiO₂ coating in contact to water. A direct correlation between the amount of surface hydroxide species, formed due to water dissociation, and Ti³⁺ defect state density is found. Furthermore, a surface water species can be identified in addition to the commonly found bulk molecular water. Together with the results from a Mott–Schottky analysis, a complete energy level alignment can be constructed.

Typ des Eintrags: Artikel
Erschienen: 2021
Autor(en): Cottre, Thorsten ; Fingerle, Mathias ; Kranz, Melanie ; Mayer, Thomas ; Kaiser, Bernhard ; Jaegermann, Wolfram
Art des Eintrags: Bibliographie
Titel: Interaction of water with atomic layer deposited titanium dioxide on p‐Si photocathode: modeling of photoelectrochemical interfaces in ultrahigh vacuum with cryo‐photoelectron spectroscopy
Sprache: Englisch
Publikationsjahr: 2021
Ort: Weinheim
Verlag: Wiley-VCH
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Advanced Materials Interfaces
Jahrgang/Volume einer Zeitschrift: 8
(Heft-)Nummer: 11
Kollation: 11 Seiten
DOI: 10.1002/admi.202002257
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Kurzbeschreibung (Abstract):

This study combines cryo‐photoelectron spectroscopy and electrochemical analysis techniques to investigate the p‐Si/SiO₂/TiO₂/H₂O system in the context of water‐splitting. Atomic layer deposition is used for the preparation of a TiO₂ thin film coating for a p‐Si/SiO₂ photocathode. First, an interface experiment is performed to study the contact properties of the interface between p‐Si/SiO₂ and TiO₂. For the p‐Si/TiO₂ heterojunction, a downward band bending of 0.3 eV is found for the p‐Si toward the interface. Second, a water adsorption experiment is conducted, which allows the investigation of the surface chemistry of the TiO₂ coating in contact to water. A direct correlation between the amount of surface hydroxide species, formed due to water dissociation, and Ti³⁺ defect state density is found. Furthermore, a surface water species can be identified in addition to the commonly found bulk molecular water. Together with the results from a Mott–Schottky analysis, a complete energy level alignment can be constructed.

Freie Schlagworte: atomic layer deposition, energy band diagrams, photoelectron spectroscopy, water adsorption
ID-Nummer: Artikel-ID: 2002257
Sachgruppe der Dewey Dezimalklassifikatin (DDC): 500 Naturwissenschaften und Mathematik > 540 Chemie
600 Technik, Medizin, angewandte Wissenschaften > 660 Technische Chemie
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung
Hinterlegungsdatum: 14 Feb 2024 08:05
Letzte Änderung: 14 Feb 2024 08:05
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