Cottre, Thorsten ; Fingerle, Mathias ; Kranz, Melanie ; Mayer, Thomas ; Kaiser, Bernhard ; Jaegermann, Wolfram (2024)
Interaction of Water with Atomic Layer Deposited Titanium Dioxide on p‐Si Photocathode: Modeling of Photoelectrochemical Interfaces in Ultrahigh Vacuum with Cryo‐Photoelectron Spectroscopy.
In: Advanced Materials Interfaces, 2021, 8 (11)
doi: 10.26083/tuprints-00020141
Artikel, Zweitveröffentlichung, Verlagsversion
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Kurzbeschreibung (Abstract)
This study combines cryo‐photoelectron spectroscopy and electrochemical analysis techniques to investigate the p‐Si/SiO₂/TiO₂/H₂O system in the context of water‐splitting. Atomic layer deposition is used for the preparation of a TiO₂ thin film coating for a p‐Si/SiO₂ photocathode. First, an interface experiment is performed to study the contact properties of the interface between p‐Si/SiO₂ and TiO₂. For the p‐Si/TiO₂ heterojunction, a downward band bending of 0.3 eV is found for the p‐Si toward the interface. Second, a water adsorption experiment is conducted, which allows the investigation of the surface chemistry of the TiO₂ coating in contact to water. A direct correlation between the amount of surface hydroxide species, formed due to water dissociation, and Ti³⁺ defect state density is found. Furthermore, a surface water species can be identified in addition to the commonly found bulk molecular water. Together with the results from a Mott–Schottky analysis, a complete energy level alignment can be constructed.
Typ des Eintrags: | Artikel |
---|---|
Erschienen: | 2024 |
Autor(en): | Cottre, Thorsten ; Fingerle, Mathias ; Kranz, Melanie ; Mayer, Thomas ; Kaiser, Bernhard ; Jaegermann, Wolfram |
Art des Eintrags: | Zweitveröffentlichung |
Titel: | Interaction of Water with Atomic Layer Deposited Titanium Dioxide on p‐Si Photocathode: Modeling of Photoelectrochemical Interfaces in Ultrahigh Vacuum with Cryo‐Photoelectron Spectroscopy |
Sprache: | Englisch |
Publikationsjahr: | 13 Februar 2024 |
Ort: | Darmstadt |
Publikationsdatum der Erstveröffentlichung: | 2021 |
Ort der Erstveröffentlichung: | Weinheim |
Verlag: | Wiley-VCH |
Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Advanced Materials Interfaces |
Jahrgang/Volume einer Zeitschrift: | 8 |
(Heft-)Nummer: | 11 |
Kollation: | 11 Seiten |
DOI: | 10.26083/tuprints-00020141 |
URL / URN: | https://tuprints.ulb.tu-darmstadt.de/20141 |
Zugehörige Links: | |
Herkunft: | Zweitveröffentlichung DeepGreen |
Kurzbeschreibung (Abstract): | This study combines cryo‐photoelectron spectroscopy and electrochemical analysis techniques to investigate the p‐Si/SiO₂/TiO₂/H₂O system in the context of water‐splitting. Atomic layer deposition is used for the preparation of a TiO₂ thin film coating for a p‐Si/SiO₂ photocathode. First, an interface experiment is performed to study the contact properties of the interface between p‐Si/SiO₂ and TiO₂. For the p‐Si/TiO₂ heterojunction, a downward band bending of 0.3 eV is found for the p‐Si toward the interface. Second, a water adsorption experiment is conducted, which allows the investigation of the surface chemistry of the TiO₂ coating in contact to water. A direct correlation between the amount of surface hydroxide species, formed due to water dissociation, and Ti³⁺ defect state density is found. Furthermore, a surface water species can be identified in addition to the commonly found bulk molecular water. Together with the results from a Mott–Schottky analysis, a complete energy level alignment can be constructed. |
Freie Schlagworte: | atomic layer deposition, energy band diagrams, photoelectron spectroscopy, water adsorption |
ID-Nummer: | Artikel-ID: 2002257 |
Status: | Verlagsversion |
URN: | urn:nbn:de:tuda-tuprints-201410 |
Sachgruppe der Dewey Dezimalklassifikatin (DDC): | 500 Naturwissenschaften und Mathematik > 540 Chemie 600 Technik, Medizin, angewandte Wissenschaften > 660 Technische Chemie |
Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung |
Hinterlegungsdatum: | 13 Feb 2024 10:36 |
Letzte Änderung: | 14 Feb 2024 08:04 |
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- Interaction of Water with Atomic Layer Deposited Titanium Dioxide on p‐Si Photocathode: Modeling of Photoelectrochemical Interfaces in Ultrahigh Vacuum with Cryo‐Photoelectron Spectroscopy. (deposited 13 Feb 2024 10:36) [Gegenwärtig angezeigt]
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