Wu, Longfei ; Dzade, Nelson Y. ; Chen, Ning ; Dijk, Bas van ; Balasubramanyam, Shashank ; Sharma, Akhil ; Gao, Lu ; Hetterscheid, Dennis G. H. ; Hensen, Emiel J. M. ; Bol, Ageeth A. ; De Leeuw, Nora H. ; Hofmann, Jan P. (2024)
Cu Electrodeposition on Nanostructured MoS₂ and WS₂ and Implications for HER Active Site Determination.
In: Journal of The Electrochemical Society, 2020, 167 (11)
doi: 10.26083/tuprints-00020395
Artikel, Zweitveröffentlichung, Verlagsversion
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Kurzbeschreibung (Abstract)
Cu electrodeposition in both underpotential and overpotential regimes on nanostructured MoS₂ and WS₂ prepared by plasma-enhanced atomic layer deposition has been studied in detail. A combination of electrochemical methods, advanced characterization by X-ray absorption spectroscopy (XAS) as well as theoretical modelling were employed to reveal Cu adsorption modes on transition metal dichalcogenides (TMDs) from initial stages until bulk deposition. Since Cu UPD on TMDs has been used recently to evaluate the number of electrochemically active sites (NAS) for H₂ evolution reaction, we evaluate and discuss here the implications of the Cu electrodeposition phenomena on nanostructured MoS₂ and WS₂ gauging the general applicability of the Cu UPD method for number of HER active sites determination in TMDs. Although an apparently better correlation of HER current density with Cu UPD charge than with double layer capacitance is found, the Cu UPD method cannot be used quantitatively because of the absence of a clear H UPD phenomenon on the studied nanostructured TMDs. This is in contrast to platinum group metal catalysts where H UPD and Cu UPD sites are strongly correlated.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2024 |
| Autor(en): | Wu, Longfei ; Dzade, Nelson Y. ; Chen, Ning ; Dijk, Bas van ; Balasubramanyam, Shashank ; Sharma, Akhil ; Gao, Lu ; Hetterscheid, Dennis G. H. ; Hensen, Emiel J. M. ; Bol, Ageeth A. ; De Leeuw, Nora H. ; Hofmann, Jan P. |
| Art des Eintrags: | Zweitveröffentlichung |
| Titel: | Cu Electrodeposition on Nanostructured MoS₂ and WS₂ and Implications for HER Active Site Determination |
| Sprache: | Englisch |
| Publikationsjahr: | 9 Januar 2024 |
| Ort: | Darmstadt |
| Publikationsdatum der Erstveröffentlichung: | 2020 |
| Ort der Erstveröffentlichung: | Bristol |
| Verlag: | IOP Publishing |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Journal of The Electrochemical Society |
| Jahrgang/Volume einer Zeitschrift: | 167 |
| (Heft-)Nummer: | 11 |
| Kollation: | 7 Seiten |
| DOI: | 10.26083/tuprints-00020395 |
| URL / URN: | https://tuprints.ulb.tu-darmstadt.de/20395 |
| Zugehörige Links: | |
| Herkunft: | Zweitveröffentlichung DeepGreen |
| Kurzbeschreibung (Abstract): | Cu electrodeposition in both underpotential and overpotential regimes on nanostructured MoS₂ and WS₂ prepared by plasma-enhanced atomic layer deposition has been studied in detail. A combination of electrochemical methods, advanced characterization by X-ray absorption spectroscopy (XAS) as well as theoretical modelling were employed to reveal Cu adsorption modes on transition metal dichalcogenides (TMDs) from initial stages until bulk deposition. Since Cu UPD on TMDs has been used recently to evaluate the number of electrochemically active sites (NAS) for H₂ evolution reaction, we evaluate and discuss here the implications of the Cu electrodeposition phenomena on nanostructured MoS₂ and WS₂ gauging the general applicability of the Cu UPD method for number of HER active sites determination in TMDs. Although an apparently better correlation of HER current density with Cu UPD charge than with double layer capacitance is found, the Cu UPD method cannot be used quantitatively because of the absence of a clear H UPD phenomenon on the studied nanostructured TMDs. This is in contrast to platinum group metal catalysts where H UPD and Cu UPD sites are strongly correlated. |
| Freie Schlagworte: | Electrocatalysis, hydrogen evolution reaction, active site determination, Cu underpotential deposition, transition metal dichalcogenides |
| ID-Nummer: | 116517 |
| Status: | Verlagsversion |
| URN: | urn:nbn:de:tuda-tuprints-203952 |
| Sachgruppe der Dewey Dezimalklassifikatin (DDC): | 500 Naturwissenschaften und Mathematik > 530 Physik 500 Naturwissenschaften und Mathematik > 540 Chemie |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung |
| Hinterlegungsdatum: | 09 Jan 2024 10:55 |
| Letzte Änderung: | 10 Jan 2024 09:45 |
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| Suche nach Titel in: | TUfind oder in Google |
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- Cu Electrodeposition on Nanostructured MoS₂ and WS₂ and Implications for HER Active Site Determination. (deposited 09 Jan 2024 10:55) [Gegenwärtig angezeigt]
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