Hermans, Yannick ; Mehmood, Faraz ; Lakus-Wollny, Kerstin ; Hofmann, Jan P. ; Mayer, Thomas ; Jaegermann, Wolfram (2021)
Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO₄ Thin Films.
In: Surfaces, 2021, 4 (2)
doi: 10.26083/tuprints-00019374
Artikel, Zweitveröffentlichung, Verlagsversion
Kurzbeschreibung (Abstract)
Thin films of ZnWO₄, a promising photocatalytic and scintillator material, were deposited for the first time using a reactive dual magnetron sputtering procedure. A ZnO target was operated using an RF signal, and a W target was operated using a DC signal. The power on the ZnO target was changed so that it would match the sputtering rate of the W target operated at 25 W. The effects of the process parameters were characterized using optical spectroscopy, X-ray diffraction, and scanning electron microscopy, including energy dispersive X-ray spectroscopy as well as X-ray photoelectron spectroscopy. It was found that stoichiometric microcrystalline ZnWO₄ thin films could be obtained, by operating the ZnO target during the sputtering procedure at a power of 55 W and by post-annealing the resulting thin films for at least 10 h at 600 °C. As FTO coated glass substrates were used, annealing led as well to the incorporation of Na, resulting in n+ doped ZnWO₄ thin films.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2021 |
| Autor(en): | Hermans, Yannick ; Mehmood, Faraz ; Lakus-Wollny, Kerstin ; Hofmann, Jan P. ; Mayer, Thomas ; Jaegermann, Wolfram |
| Art des Eintrags: | Zweitveröffentlichung |
| Titel: | Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO₄ Thin Films |
| Sprache: | Englisch |
| Publikationsjahr: | 2021 |
| Publikationsdatum der Erstveröffentlichung: | 2021 |
| Verlag: | MDPI |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Surfaces |
| Jahrgang/Volume einer Zeitschrift: | 4 |
| (Heft-)Nummer: | 2 |
| DOI: | 10.26083/tuprints-00019374 |
| URL / URN: | https://tuprints.ulb.tu-darmstadt.de/19374 |
| Zugehörige Links: | |
| Herkunft: | Zweitveröffentlichungsservice |
| Kurzbeschreibung (Abstract): | Thin films of ZnWO₄, a promising photocatalytic and scintillator material, were deposited for the first time using a reactive dual magnetron sputtering procedure. A ZnO target was operated using an RF signal, and a W target was operated using a DC signal. The power on the ZnO target was changed so that it would match the sputtering rate of the W target operated at 25 W. The effects of the process parameters were characterized using optical spectroscopy, X-ray diffraction, and scanning electron microscopy, including energy dispersive X-ray spectroscopy as well as X-ray photoelectron spectroscopy. It was found that stoichiometric microcrystalline ZnWO₄ thin films could be obtained, by operating the ZnO target during the sputtering procedure at a power of 55 W and by post-annealing the resulting thin films for at least 10 h at 600 °C. As FTO coated glass substrates were used, annealing led as well to the incorporation of Na, resulting in n+ doped ZnWO₄ thin films. |
| Status: | Verlagsversion |
| URN: | urn:nbn:de:tuda-tuprints-193749 |
| Zusätzliche Informationen: | Supplementary Material: https://www.mdpi.com/2571-9637/4/2/13/s1 |
| Sachgruppe der Dewey Dezimalklassifikatin (DDC): | 500 Naturwissenschaften und Mathematik > 540 Chemie 600 Technik, Medizin, angewandte Wissenschaften > 620 Ingenieurwissenschaften und Maschinenbau |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Oberflächenforschung |
| Hinterlegungsdatum: | 26 Aug 2021 12:30 |
| Letzte Änderung: | 31 Aug 2021 05:15 |
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