TU Darmstadt / ULB / TUbiblio

Fermi Level Engineering for Large Permittivity in BaTiO3-Based Multilayers

Chavarría, Christopher Castro ; Payan, Sandrine ; Salvetat, Jean-Paul ; Maglione, Mario ; Klein, Andreas (2021)
Fermi Level Engineering for Large Permittivity in BaTiO3-Based Multilayers.
In: Surfaces, 2020, 3 (4)
doi: 10.26083/tuprints-00019261
Artikel, Zweitveröffentlichung, Verlagsversion

WarnungEs ist eine neuere Version dieses Eintrags verfügbar.

Kurzbeschreibung (Abstract)

Multilayered doped BaTiO3 thin films have been fabricated by physical vapor deposition (PVD) on low-cost polycrystalline substrates with the aim to improve dielectric properties by controlling point charge defects at the interfaces. We show that carefully designed interfaces lead to increasing the relative permittivity of the BaTiO3 thin films, in contradiction with the common belief that interfaces behave as dead layers. High relative permittivity up to 1030 and tanδ = 4% at 100 kHz and room temperature were obtained on BaTiO3 multilayered films deposited on Si/Pt substrates by PVD. The large permittivity is suspected to be an extrinsic contribution due to band bending at the interfaces, as inferred by in-situ X-ray photoelectron spectroscopy. A 20-nm depletion layer was found to be associated with an interdiffusion of dopants, as measured by depth profiling with time-of-flight secondary ion mass spectrometry. The films exhibit high permittivity and low dielectric losses stable between 200 and 400 K, which meet the requirement of electronic applications.

Typ des Eintrags: Artikel
Erschienen: 2021
Autor(en): Chavarría, Christopher Castro ; Payan, Sandrine ; Salvetat, Jean-Paul ; Maglione, Mario ; Klein, Andreas
Art des Eintrags: Zweitveröffentlichung
Titel: Fermi Level Engineering for Large Permittivity in BaTiO3-Based Multilayers
Sprache: Englisch
Publikationsjahr: 2021
Publikationsdatum der Erstveröffentlichung: 2020
Verlag: MDPI
Titel der Zeitschrift, Zeitung oder Schriftenreihe: Surfaces
Jahrgang/Volume einer Zeitschrift: 3
(Heft-)Nummer: 4
DOI: 10.26083/tuprints-00019261
URL / URN: https://tuprints.ulb.tu-darmstadt.de/19261
Zugehörige Links:
Herkunft: Zweitveröffentlichung aus gefördertem Golden Open Access
Kurzbeschreibung (Abstract):

Multilayered doped BaTiO3 thin films have been fabricated by physical vapor deposition (PVD) on low-cost polycrystalline substrates with the aim to improve dielectric properties by controlling point charge defects at the interfaces. We show that carefully designed interfaces lead to increasing the relative permittivity of the BaTiO3 thin films, in contradiction with the common belief that interfaces behave as dead layers. High relative permittivity up to 1030 and tanδ = 4% at 100 kHz and room temperature were obtained on BaTiO3 multilayered films deposited on Si/Pt substrates by PVD. The large permittivity is suspected to be an extrinsic contribution due to band bending at the interfaces, as inferred by in-situ X-ray photoelectron spectroscopy. A 20-nm depletion layer was found to be associated with an interdiffusion of dopants, as measured by depth profiling with time-of-flight secondary ion mass spectrometry. The films exhibit high permittivity and low dielectric losses stable between 200 and 400 K, which meet the requirement of electronic applications.

Status: Verlagsversion
URN: urn:nbn:de:tuda-tuprints-192615
Sachgruppe der Dewey Dezimalklassifikatin (DDC): 600 Technik, Medizin, angewandte Wissenschaften > 600 Technik
Fachbereich(e)/-gebiet(e): 11 Fachbereich Material- und Geowissenschaften
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft
11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Elektronenstruktur von Materialien
Hinterlegungsdatum: 06 Aug 2021 07:19
Letzte Änderung: 11 Aug 2021 06:40
PPN:
Export:
Suche nach Titel in: TUfind oder in Google

Verfügbare Versionen dieses Eintrags

Frage zum Eintrag Frage zum Eintrag

Optionen (nur für Redakteure)
Redaktionelle Details anzeigen Redaktionelle Details anzeigen