Baba, Koumei ; Hatada, Ruriko ; Flege, Stefan ; Ensinger, Wolfgang (2020)
Diamond-Like Carbon Films with Low Internal Stress by a Simple Bilayer Approach.
In: Coatings, 10 (7)
doi: 10.3390/coatings10070696
Artikel, Bibliographie
Kurzbeschreibung (Abstract)
Amorphous carbon films with a high hardness usually suffer from high internal stress. To deposit films with a hard top surface but reduced internal stress, a simple bilayer approach was used. Films were prepared by plasma source ion implantation, using only hydrocarbon precursors. The single layer with the highest hardness (deposited by a low direct current (DC) voltage and radio frequency (RF) generation of the plasma) has the highest internal stress with more than 3.5 GPa. By adding an interlayer with a lower hardness, the resulting stress of the bilayer film can be reduced to below 1.4 GPa while maintaining the high hardness of the top layer. By avoiding metallic interlayers or dopants within the films, the deposition process can be kept simple and cost-effective, and it is also suitable for three-dimensional samples.
| Typ des Eintrags: | Artikel |
|---|---|
| Erschienen: | 2020 |
| Autor(en): | Baba, Koumei ; Hatada, Ruriko ; Flege, Stefan ; Ensinger, Wolfgang |
| Art des Eintrags: | Bibliographie |
| Titel: | Diamond-Like Carbon Films with Low Internal Stress by a Simple Bilayer Approach |
| Sprache: | Englisch |
| Publikationsjahr: | 19 Juli 2020 |
| Verlag: | MDPI |
| Titel der Zeitschrift, Zeitung oder Schriftenreihe: | Coatings |
| Jahrgang/Volume einer Zeitschrift: | 10 |
| (Heft-)Nummer: | 7 |
| DOI: | 10.3390/coatings10070696 |
| URL / URN: | https://www.mdpi.com/2079-6412/10/7/696 |
| Kurzbeschreibung (Abstract): | Amorphous carbon films with a high hardness usually suffer from high internal stress. To deposit films with a hard top surface but reduced internal stress, a simple bilayer approach was used. Films were prepared by plasma source ion implantation, using only hydrocarbon precursors. The single layer with the highest hardness (deposited by a low direct current (DC) voltage and radio frequency (RF) generation of the plasma) has the highest internal stress with more than 3.5 GPa. By adding an interlayer with a lower hardness, the resulting stress of the bilayer film can be reduced to below 1.4 GPa while maintaining the high hardness of the top layer. By avoiding metallic interlayers or dopants within the films, the deposition process can be kept simple and cost-effective, and it is also suitable for three-dimensional samples. |
| Freie Schlagworte: | Diamond-like carbon, hardness, bilayer, plasma source ion implantation, internal stress |
| Fachbereich(e)/-gebiet(e): | 11 Fachbereich Material- und Geowissenschaften 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft 11 Fachbereich Material- und Geowissenschaften > Materialwissenschaft > Fachgebiet Materialanalytik |
| Hinterlegungsdatum: | 20 Nov 2020 08:15 |
| Letzte Änderung: | 20 Nov 2020 08:15 |
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