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CZE application with an ITP initial state to determine anionic impurities on as-polished silicon wafer surfaces

Boden, Jana and Bächmann, K. and Lotz, and Fabry, and Pahlke, (1995):
CZE application with an ITP initial state to determine anionic impurities on as-polished silicon wafer surfaces.
In: Journal of chromatography. A 696 (1995), S. 321-332, [Article]

Item Type: Article
Erschienen: 1995
Creators: Boden, Jana and Bächmann, K. and Lotz, and Fabry, and Pahlke,
Title: CZE application with an ITP initial state to determine anionic impurities on as-polished silicon wafer surfaces
Language: English
Journal or Publication Title: Journal of chromatography. A 696 (1995), S. 321-332
Divisions: 07 Department of Chemistry
07 Department of Chemistry > Fachgebiet Anorganische Chemie
Date Deposited: 19 Nov 2008 15:55
License: [undefiniert]
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