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Electrical Properties of Low-Temperature Processed Sn-Doped In2O3 Thin Films: The Role of Microstructure and Oxygen Content and the Potential of Defect Modulation Doping.
In: Materials, 12 (14), p. 2232. ISSN 1996-1944,
DOI: 10.3390/ma12142232,
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Deyu, Getnet Kacha ; Hunka, Jonas ; Roussel, Hervé ; Brötz, Joachim ; Bellet, Daniel ; Klein, Andreas (2019):
Electrical Properties of Low-Temperature Processed Sn-Doped In₂O₃ Thin Films: The Role of Microstructure and Oxygen Content and the Potential of Defect Modulation Doping.
In: Materials, 12 (14), MDPI, ISSN 1996-1944,
DOI: 10.3390/ma12142232,
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Zhang, Shan-Ting ; Rouvière, Jean-Luc ; Consonni, Vincent ; Roussel, Hervé ; Rapenne, Laetitia ; Pernot, Etienne ; Muñoz-Rojas, David ; Klein, Andreas ; Bellet, Daniel (2017):
High quality epitaxial fluorine-doped SnO2 films by ultrasonic spray pyrolysis: Structural and physical property investigation.
In: Materials & Design, 132, pp. 518-525. Elsevier Science Publishing, ISSN 02641275,
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Zhang, Shan-Ting ; Roussel, Hervé ; Chaix-Pluchery, Odette ; Langlet, Michel ; Muñoz-Rojas, David ; Bellet, Daniel ; Klein, Andreas (2017):
Polymorphism of the Blocking TiO2 Layer Deposited on F:SnO2 and Its Influence on the Interfacial Energetic Alignment.
In: The Journal of Physical Chemistry C, 121 (32), pp. 17305-17313. American Chemical Society Publications, ISSN 1932-7447,
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Dusciac, Dorin ; Brizé, Virginie ; Chazalviel, Jean-Noël ; Lai, Yun-Feng ; Roussel, Hervé ; Blonkowski, Serge ; Schafranek, Robert ; Klein, Andreas ; Henry de Villeneuve, Catherine ; Allongue, Philippe ; Ozanam, François ; Dubourdieu, Catherine (2012):
Organic Grafting on Si for Interfacial SiO2 Growth Inhibition During Chemical Vapor Deposition of HfO2.
In: Chemistry of Materials, 24 (16), pp. 3135-3142. ACS Publications, ISSN 0897-4756,
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