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Gottwald, P. ; Kräutle, ; Szentpali, B. ; Kincses, Z. ; Hartnagel, H. L. (1997):
Damage characterization of InP after reactive ion etching using the low-frequency noise measurement technique.
In: Solid state electronics, 41 (4), pp. 539-545. Elsevier, ISSN 0038-1101,
[Article]

Gottwald, P. ; Riemenschneider, R. ; Szentpali, B. ; Hartnagel, H. L. ; Kincses, Z. ; Ruszinko, M. (1995):
Comparison of photo- and plasma-assisted passivating process effects on GaAs devices by means of low-frequency noise measurements.
In: Solid state electronics, 38 (2), pp. 413-417. Elsevier, ISSN 0038-1101,
DOI: https://ui.adsabs.harvard.edu/link_gateway/1995SSEle..38..413G/doi:10.1016/0038-1101(94)00100-T,
[Article]

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