Gottwald, P. ; Riemenschneider, R. ; Szentpali, B. ; Hartnagel, H. L. ; Kincses, Z. ; Ruszinko, M. (1995)
Comparison of photo- and plasma-assisted passivating process effects on GaAs devices by means of low-frequency noise measurements.
In: Solid state electronics, 38 (2)
doi: 10.1016/0038-1101(94)00100-T
Article, Bibliographie
Item Type: | Article |
---|---|
Erschienen: | 1995 |
Creators: | Gottwald, P. ; Riemenschneider, R. ; Szentpali, B. ; Hartnagel, H. L. ; Kincses, Z. ; Ruszinko, M. |
Type of entry: | Bibliographie |
Title: | Comparison of photo- and plasma-assisted passivating process effects on GaAs devices by means of low-frequency noise measurements |
Language: | English |
Date: | 1995 |
Publisher: | Elsevier |
Journal or Publication Title: | Solid state electronics |
Volume of the journal: | 38 |
Issue Number: | 2 |
DOI: | 10.1016/0038-1101(94)00100-T |
Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Microwave Electronics |
Date Deposited: | 19 Nov 2008 16:05 |
Last Modified: | 24 Feb 2022 12:33 |
PPN: | |
Export: | |
Suche nach Titel in: | TUfind oder in Google |
Send an inquiry |
Options (only for editors)
Show editorial Details |