Krauss, Tillmann ; Wessely, Frank ; Schwalke, Udo (2017)
Fabrication and Simulation of Electrically Reconfigurable Dual Metal-gate Planar Field-effect Transistors for Dopant-free CMOS.
In: 12th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS)
Book Section, Bibliographie
URL / URN: https://doi.org/10.1109/DTIS.2017.7930155
| Item Type: | Book Section |
|---|---|
| Erschienen: | 2017 |
| Creators: | Krauss, Tillmann ; Wessely, Frank ; Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Fabrication and Simulation of Electrically Reconfigurable Dual Metal-gate Planar Field-effect Transistors for Dopant-free CMOS |
| Language: | English |
| Date: | 18 May 2017 |
| Journal or Publication Title: | 12th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS) |
| Book Title: | 12th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS) |
| URL / URN: | https://doi.org/10.1109/DTIS.2017.7930155 |
| Additional Information: | 12th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS), Palma de Mallorca, Spain, 04.-06.04.2017 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 04 Jul 2017 08:09 |
| Last Modified: | 08 May 2024 09:35 |
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