Gottwald, P. ; Kräutle, ; Szentpali, B. ; Kincses, Z. ; Hartnagel, H. L. (1997)
Damage characterization of InP after reactive ion etching using the low-frequency noise measurement technique.
In: Solid state electronics, 41 (4)
Article, Bibliographie
| Item Type: | Article |
|---|---|
| Erschienen: | 1997 |
| Creators: | Gottwald, P. ; Kräutle, ; Szentpali, B. ; Kincses, Z. ; Hartnagel, H. L. |
| Type of entry: | Bibliographie |
| Title: | Damage characterization of InP after reactive ion etching using the low-frequency noise measurement technique |
| Language: | English |
| Date: | 1997 |
| Publisher: | Elsevier |
| Journal or Publication Title: | Solid state electronics |
| Volume of the journal: | 41 |
| Issue Number: | 4 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Microwave Electronics |
| Date Deposited: | 19 Nov 2008 16:04 |
| Last Modified: | 24 Feb 2022 12:36 |
| PPN: | |
| Export: | |
| Suche nach Titel in: | TUfind oder in Google |
 |
Send an inquiry |
Options (only for editors)
 |
Show editorial Details |
Drucken
Impressum