Böttner, Th. ; Kräutle, H. ; Kuphal, E. ; Miethe, K. ; Hartnagel, H. L. (1996)
Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2.
Conference or Workshop Item
| Item Type: | Conference or Workshop Item |
|---|---|
| Erschienen: | 1996 |
| Creators: | Böttner, Th. ; Kräutle, H. ; Kuphal, E. ; Miethe, K. ; Hartnagel, H. L. |
| Type of entry: | Bibliographie |
| Title: | Surface- and sidewall-damage of InP-based optoelectronic devices during reactive ion etching using CH4/H2 |
| Language: | English |
| Date: | 1 January 1996 |
| Book Title: | International Conference on Indium Phosphide and Related Materials : 8, 1996, Schwäbisch Gmünd ; Proceedings |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Microwave Electronics |
| Date Deposited: | 19 Nov 2008 16:04 |
| Last Modified: | 10 Mar 2022 13:23 |
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