Kunst, M. ; Jaegermann, W. ; Schmeisser, D. (1987)
Chemical etching of p-type Si(lOO) by K2Cr2O7: A combined investigation by TRMC, XPS, UPS and LEED.
In: Applied Physics A Solids and Surfaces, 42 (1)
doi: 10.1007/BF00618159
Article, Bibliographie
| Item Type: | Article |
|---|---|
| Erschienen: | 1987 |
| Creators: | Kunst, M. ; Jaegermann, W. ; Schmeisser, D. |
| Type of entry: | Bibliographie |
| Title: | Chemical etching of p-type Si(lOO) by K2Cr2O7: A combined investigation by TRMC, XPS, UPS and LEED |
| Language: | English |
| Date: | 1987 |
| Journal or Publication Title: | Applied Physics A Solids and Surfaces |
| Volume of the journal: | 42 |
| Issue Number: | 1 |
| DOI: | 10.1007/BF00618159 |
| Divisions: | 11 Department of Materials and Earth Sciences 11 Department of Materials and Earth Sciences > Material Science 11 Department of Materials and Earth Sciences > Material Science > Surface Science |
| Date Deposited: | 22 Apr 2015 08:51 |
| Last Modified: | 22 Apr 2015 08:51 |
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