Roodenko, K. ; Gensch, M. ; Rappich, J. ; Hinrichs, K. ; Esser, N. ; Hunger, R. (2007)
Time-Resolved Synchrotron XPS Monitoring of Irradiation-Induced Nitrobenzene Reduction for Chemical Lithography.
In: The Journal of Physical Chemistry B, 111 (26)
doi: 10.1021/jp072440j
Article, Bibliographie
| Item Type: | Article |
|---|---|
| Erschienen: | 2007 |
| Creators: | Roodenko, K. ; Gensch, M. ; Rappich, J. ; Hinrichs, K. ; Esser, N. ; Hunger, R. |
| Type of entry: | Bibliographie |
| Title: | Time-Resolved Synchrotron XPS Monitoring of Irradiation-Induced Nitrobenzene Reduction for Chemical Lithography |
| Language: | English |
| Date: | 2007 |
| Journal or Publication Title: | The Journal of Physical Chemistry B |
| Volume of the journal: | 111 |
| Issue Number: | 26 |
| DOI: | 10.1021/jp072440j |
| Divisions: | 11 Department of Materials and Earth Sciences 11 Department of Materials and Earth Sciences > Material Science 11 Department of Materials and Earth Sciences > Material Science > Surface Science |
| Date Deposited: | 23 Mar 2015 18:00 |
| Last Modified: | 23 Mar 2015 18:00 |
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