Kim-Ngan, Nhu-T. H. ; Havela, L. ; Adamska, A. M. ; Danis, S. ; Pesicka, J. ; Macl, J. ; Eloirdi, R. ; Huber, F. ; Gouder, T. ; Balogh, A. G. (2011)
Characterization of U-based thin films: the UFe2+xcase.
In: Journal of Physics: Conference Series, 303 (1)
doi: 10.1088/1742-6596/303/1/012012
Article, Bibliographie
This is the latest version of this item.
Abstract
We have characterized UFe2+x films prepared by sputter deposition onto fused silica (SiO2) and Si(111) substrates with the film thickness ranging from 75 nm to 900 nm. The Xray diffraction results showed an amorphous character of the deposited material. Some of the films showed in addition a pattern of highly textured cubic Laves phase. Rutherford Backscattering Spectroscopy with 2 MeV He+ ions has been used to determine the composition, thickness and concentration depth profile of the films. A large ageing affect was observed within 1 month after that the films were exposed to air. Magnetic measurements revealed TC increasing with relative Fe concentration and reaching approx. 450 K in UFe3.0.
| Item Type: | Article |
|---|---|
| Erschienen: | 2011 |
| Creators: | Kim-Ngan, Nhu-T. H. ; Havela, L. ; Adamska, A. M. ; Danis, S. ; Pesicka, J. ; Macl, J. ; Eloirdi, R. ; Huber, F. ; Gouder, T. ; Balogh, A. G. |
| Type of entry: | Bibliographie |
| Title: | Characterization of U-based thin films: the UFe2+xcase |
| Language: | English |
| Date: | 2011 |
| Publisher: | IOP Publishing |
| Journal or Publication Title: | Journal of Physics: Conference Series |
| Volume of the journal: | 303 |
| Issue Number: | 1 |
| DOI: | 10.1088/1742-6596/303/1/012012 |
| Corresponding Links: | |
| Abstract: | We have characterized UFe2+x films prepared by sputter deposition onto fused silica (SiO2) and Si(111) substrates with the film thickness ranging from 75 nm to 900 nm. The Xray diffraction results showed an amorphous character of the deposited material. Some of the films showed in addition a pattern of highly textured cubic Laves phase. Rutherford Backscattering Spectroscopy with 2 MeV He+ ions has been used to determine the composition, thickness and concentration depth profile of the films. A large ageing affect was observed within 1 month after that the films were exposed to air. Magnetic measurements revealed TC increasing with relative Fe concentration and reaching approx. 450 K in UFe3.0. |
| Additional Information: | Joint European Magnetic Symposia – JEMS 2010 |
| Divisions: | 11 Department of Materials and Earth Sciences 11 Department of Materials and Earth Sciences > Material Science 11 Department of Materials and Earth Sciences > Material Science > Material Analytics |
| Date Deposited: | 12 Dec 2012 12:23 |
| Last Modified: | 24 Jan 2024 07:27 |
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Characterization of U-based thin films: the UFe₂₊ₓ case. (deposited 23 Jan 2024 10:05)
- Characterization of U-based thin films: the UFe2+xcase. (deposited 12 Dec 2012 12:23) [Currently Displayed]
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