Lee, Y.-Y. ; Heck, C. ; Chayahara, A. ; Horino, Y. ; Ensinger, W. ; Enders, B. (2003)
Electrochemical porosity determination of thin protective films on iron base materials.
In: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 206
doi: 10.1016/S0168-583X(03)00843-7
Article, Bibliographie
Abstract
In this contribution we apply a recently developed technique to measure the porosity of thin films by means of an electrochemical method. As a model system thin iron films deposited on silicon wafers and coated with amorphous carbon protective films were chosen. The depositions were done with coaxial arc deposition. Rutherford backscattering spectroscopy, scanning electron microscopy and electrochemical measurements were carried out to characterize the films in dependence on deposition parameters and pre-cleaning procedures. Experiments show the validity of the introduced model. With the presented measurement technique it will be possible to study the dependence and control ability of thin films porosity by energetic ion bombardment during film growth. This is a relevant application for the corrosion properties of bulk materials coated with thin protective films which strongly depend on their porosity.
| Item Type: | Article |
|---|---|
| Erschienen: | 2003 |
| Creators: | Lee, Y.-Y. ; Heck, C. ; Chayahara, A. ; Horino, Y. ; Ensinger, W. ; Enders, B. |
| Type of entry: | Bibliographie |
| Title: | Electrochemical porosity determination of thin protective films on iron base materials |
| Language: | English |
| Date: | May 2003 |
| Publisher: | Elsevier |
| Journal or Publication Title: | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |
| Volume of the journal: | 206 |
| DOI: | 10.1016/S0168-583X(03)00843-7 |
| Abstract: | In this contribution we apply a recently developed technique to measure the porosity of thin films by means of an electrochemical method. As a model system thin iron films deposited on silicon wafers and coated with amorphous carbon protective films were chosen. The depositions were done with coaxial arc deposition. Rutherford backscattering spectroscopy, scanning electron microscopy and electrochemical measurements were carried out to characterize the films in dependence on deposition parameters and pre-cleaning procedures. Experiments show the validity of the introduced model. With the presented measurement technique it will be possible to study the dependence and control ability of thin films porosity by energetic ion bombardment during film growth. This is a relevant application for the corrosion properties of bulk materials coated with thin protective films which strongly depend on their porosity. |
| Uncontrolled Keywords: | Coaxial arc deposition, Modelling, Iron and carbon thin films |
| Divisions: | 11 Department of Materials and Earth Sciences > Material Science > Material Analytics 11 Department of Materials and Earth Sciences > Material Science 11 Department of Materials and Earth Sciences |
| Date Deposited: | 15 Nov 2012 09:41 |
| Last Modified: | 05 Mar 2013 10:03 |
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