Endres, Ralf ; Schwalke, Udo (2008)
Damascene Metal Gate Technology for Damage-Free High-k Process Integration.
In: Proceedings of the 7th International Semiconductor Technology Conference (ISTC)
Article, Bibliographie
| Item Type: | Article |
|---|---|
| Erschienen: | 2008 |
| Creators: | Endres, Ralf ; Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Damascene Metal Gate Technology for Damage-Free High-k Process Integration |
| Language: | English |
| Date: | 17 March 2008 |
| Journal or Publication Title: | Proceedings of the 7th International Semiconductor Technology Conference (ISTC) |
| Additional Information: | 7th International Semiconductor Technology Conference (ISTC), Shanghai, China, 15.-17.03.2008 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 01 Jul 2011 08:29 |
| Last Modified: | 08 May 2024 08:20 |
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