Rispal, Lorraine ; Tschischke, T. ; Yang, Hongyu ; Schwalke, Udo (2008)
Polymethyl Methacrylate Passivation of Carbon Nanotube Field-Effect Transistors: Novel Self-aligned Process and Influence on Device Transfer Characteristic Hysteresis.
In: Japanese Journal of Applied Physics, 47 (4)
Article, Bibliographie
URL / URN: http://dx.doi.org/10.1143/JJAP.47.3287
| Item Type: | Article |
|---|---|
| Erschienen: | 2008 |
| Creators: | Rispal, Lorraine ; Tschischke, T. ; Yang, Hongyu ; Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Polymethyl Methacrylate Passivation of Carbon Nanotube Field-Effect Transistors: Novel Self-aligned Process and Influence on Device Transfer Characteristic Hysteresis |
| Language: | English |
| Date: | 2008 |
| Journal or Publication Title: | Japanese Journal of Applied Physics |
| Volume of the journal: | 47 |
| Issue Number: | 4 |
| URL / URN: | http://dx.doi.org/10.1143/JJAP.47.3287 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 29 Jun 2011 10:37 |
| Last Modified: | 05 Mar 2013 09:50 |
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