Rispal, Lorraine ; Schwalke, Udo (2008)
Large-Scale In Situ Fabrication of Voltage-Programmable Dual-Layer High-k Dielectric Carbon Nanotube Memory Devices With High On/Off Ratio.
In: IEEE Electron Device Letters, 29 (12)
Article, Bibliographie
URL / URN: http://dx.doi.org/10.1109/LED.2008.2005850
| Item Type: | Article |
|---|---|
| Erschienen: | 2008 |
| Creators: | Rispal, Lorraine ; Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Large-Scale In Situ Fabrication of Voltage-Programmable Dual-Layer High-k Dielectric Carbon Nanotube Memory Devices With High On/Off Ratio |
| Language: | English |
| Date: | 7 November 2008 |
| Journal or Publication Title: | IEEE Electron Device Letters |
| Volume of the journal: | 29 |
| Issue Number: | 12 |
| URL / URN: | http://dx.doi.org/10.1109/LED.2008.2005850 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 29 Jun 2011 10:20 |
| Last Modified: | 05 Mar 2013 09:50 |
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