Schwalke, Udo (2009)
Damscene Metal Gate Technology: A Solution to High-K Gate Stack Challenges?
DGM Arbeitskreis "Materialien für elektronische Anwendungen". Berlin, Deutschland (20.02.2009)
Conference or Workshop Item, Bibliographie
| Item Type: | Conference or Workshop Item |
|---|---|
| Erschienen: | 2009 |
| Creators: | Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Damscene Metal Gate Technology: A Solution to High-K Gate Stack Challenges? |
| Language: | English |
| Date: | 20 February 2009 |
| Place of Publication: | Berlin |
| Event Title: | DGM Arbeitskreis "Materialien für elektronische Anwendungen" |
| Event Location: | Berlin, Deutschland |
| Event Dates: | 20.02.2009 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 29 Jun 2011 09:34 |
| Last Modified: | 07 May 2024 10:13 |
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