Endres, Ralf ; Krauss, Tillmann ; Wessely, Frank ; Schwalke, Udo (2011)
Damascene TiN-Gd2O3-Gate Stacks: Gentle Fabrication and Electrical Properties.
In: Microelectronic Engineering, 88 (12)
Article, Bibliographie
URL / URN: http://dx.doi.org/10.1016/j.mee.2010.05.013
| Item Type: | Article |
|---|---|
| Erschienen: | 2011 |
| Creators: | Endres, Ralf ; Krauss, Tillmann ; Wessely, Frank ; Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Damascene TiN-Gd2O3-Gate Stacks: Gentle Fabrication and Electrical Properties |
| Language: | English |
| Date: | December 2011 |
| Journal or Publication Title: | Microelectronic Engineering |
| Volume of the journal: | 88 |
| Issue Number: | 12 |
| URL / URN: | http://dx.doi.org/10.1016/j.mee.2010.05.013 |
| Additional Information: | 6th International Symposium on Advanced Gate Stack Technology (ISAGST), San Francisco, CA, USA, 23.-26.08.2009 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 28 Jun 2011 14:32 |
| Last Modified: | 08 May 2024 08:49 |
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