Endres, Ralf ; Wessely, Frank ; Schwalke, Udo (2008)
CMP-based Gate Last High-K Integration.
In: Proceedings of the 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE)
Article, Bibliographie
Item Type: | Article |
---|---|
Erschienen: | 2008 |
Creators: | Endres, Ralf ; Wessely, Frank ; Schwalke, Udo |
Type of entry: | Bibliographie |
Title: | CMP-based Gate Last High-K Integration |
Language: | English |
Date: | 28 November 2008 |
Journal or Publication Title: | Proceedings of the 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE) |
URL / URN: | http://www.stw.nl/NR/rdonlyres/678497B6-D48F-4F76-94AF-EB589... |
Additional Information: | 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE), Veldhoven, Niederlande, 27.-28.11.2008 |
Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
Date Deposited: | 29 Jun 2011 09:46 |
Last Modified: | 08 May 2024 09:03 |
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