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CMP-based Gate Last High-K Integration

Endres, Ralf ; Wessely, Frank ; Schwalke, Udo (2008)
CMP-based Gate Last High-K Integration.
In: Proceedings of the 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE)
Article, Bibliographie

Item Type: Article
Erschienen: 2008
Creators: Endres, Ralf ; Wessely, Frank ; Schwalke, Udo
Type of entry: Bibliographie
Title: CMP-based Gate Last High-K Integration
Language: English
Date: 28 November 2008
Journal or Publication Title: Proceedings of the 11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE)
URL / URN: http://www.stw.nl/NR/rdonlyres/678497B6-D48F-4F76-94AF-EB589...
Additional Information:

11th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE), Veldhoven, Niederlande, 27.-28.11.2008

Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Date Deposited: 29 Jun 2011 09:46
Last Modified: 08 May 2024 09:03
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