Endres, Ralf ; Krauss, Tillmann ; Wessely, Frank ; Schwalke, Udo (2009)
Damascene Metal Gate Technology for Damage-free Gate-Last High-K Process Integration.
In: 3rd International Conference on Signals, Circuits and Systems (SCS)
Article, Bibliographie
URL / URN: http://dx.doi.org/10.1109/ICSCS.2009.5414209
| Item Type: | Article |
|---|---|
| Erschienen: | 2009 |
| Creators: | Endres, Ralf ; Krauss, Tillmann ; Wessely, Frank ; Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Damascene Metal Gate Technology for Damage-free Gate-Last High-K Process Integration |
| Language: | English |
| Date: | 8 November 2009 |
| Journal or Publication Title: | 3rd International Conference on Signals, Circuits and Systems (SCS) |
| URL / URN: | http://dx.doi.org/10.1109/ICSCS.2009.5414209 |
| Additional Information: | 3rd International Conference on Signals, Circuits and Systems (SCS), Djerba, Tunesien, 06.-08.11.2009 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 28 Jun 2011 14:09 |
| Last Modified: | 07 May 2024 11:12 |
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