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Process Integration of Crystalline Pr2O3 High-k Gate Dielectrics

Schwalke, Udo ; Boye, K. ; Haberle, Klaus ; Heller, Rudolf ; Hess, Gisela ; Müller, Gudrun ; Ruland, Tino ; Tzschöckel, Gerhard ; Osten, H. J. ; Fissel, A. ; Müssig, H.-J. (2002)
Process Integration of Crystalline Pr2O3 High-k Gate Dielectrics.
In: Proceedings of 32nd European Solid State Device Research Conference (ESSDERC)
Article, Bibliographie

Item Type: Article
Erschienen: 2002
Creators: Schwalke, Udo ; Boye, K. ; Haberle, Klaus ; Heller, Rudolf ; Hess, Gisela ; Müller, Gudrun ; Ruland, Tino ; Tzschöckel, Gerhard ; Osten, H. J. ; Fissel, A. ; Müssig, H.-J.
Type of entry: Bibliographie
Title: Process Integration of Crystalline Pr2O3 High-k Gate Dielectrics
Language: English
Date: 26 September 2002
Journal or Publication Title: Proceedings of 32nd European Solid State Device Research Conference (ESSDERC)
URL / URN: http://dx.doi.org/10.1109/ESSDERC.2002.194954
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Date Deposited: 27 Jun 2011 13:47
Last Modified: 22 May 2013 13:52
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