Kerber, Andreas ; Cartier, E. ; Pantisano, L. ; Rosmeulen, M. ; Degraeve, R. ; Kauerauf, T. ; Groeseneken, G. ; Maes, H. E. ; Schwalke, Udo (2003)
Characterization of the VT Instability in SiO2/HfO2 Gate Dielectrics.
In: Proceedings of the IEEE International Reliability Physics Symposium (IRPS)
Article, Bibliographie
| Item Type: | Article |
|---|---|
| Erschienen: | 2003 |
| Creators: | Kerber, Andreas ; Cartier, E. ; Pantisano, L. ; Rosmeulen, M. ; Degraeve, R. ; Kauerauf, T. ; Groeseneken, G. ; Maes, H. E. ; Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Characterization of the VT Instability in SiO2/HfO2 Gate Dielectrics |
| Language: | English |
| Date: | 4 April 2003 |
| Journal or Publication Title: | Proceedings of the IEEE International Reliability Physics Symposium (IRPS) |
| URL / URN: | http://dx.doi.org/10.1109/RELPHY.2003.1197718 |
| Additional Information: | IEEE International Reliability Physics Symposium (IRPS), Dallas, TX, USA, 30.03.-03.04.2003 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 19 Nov 2008 15:58 |
| Last Modified: | 08 May 2024 09:11 |
| PPN: | |
| Export: | |
| Suche nach Titel in: | TUfind oder in Google |
 |
Send an inquiry |
Options (only for editors)
 |
Show editorial Details |
Drucken
Impressum