| Item Type: |
Article
|
| Erschienen: |
2003 |
| Creators: |
Kerber, Andreas ; Cartier, E. ; Pantisano, L. ; Rosmeulen, M. ; Degraeve, R. ; Kauerauf, T. ; Groeseneken, G. ; Maes, H. E. ; Schwalke, Udo |
| Title: |
Characterization of the VT Instability in SiO2/HfO2 Gate Dielectrics |
| Language: |
English |
| Journal or Publication Title: |
Proceedings of the IEEE International Reliability Physics Symposium (IRPS) |
| Divisions: |
18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Event Title: |
IEEE International Reliability Physics Symposium (IRPS) |
| Event Location: |
Dallas, TX, USA |
| Event Dates: |
30.03.-03.04.2003 |
| Date Deposited: |
19 Nov 2008 15:58 |
| URL / URN: |
http://dx.doi.org/10.1109/RELPHY.2003.1197718 |
| License: |
[undefiniert] |
| PPN: |
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| Export: |
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