Riemenschneider, Rolf ; Gottwald, ; Hartnagel, (1995)
Characterisation of SiO2 deposition by low-temperature plasma and photo CVD using low-frequency noise measurements.
Conference or Workshop Item
| Item Type: | Conference or Workshop Item |
|---|---|
| Erschienen: | 1995 |
| Creators: | Riemenschneider, Rolf ; Gottwald, ; Hartnagel, |
| Type of entry: | Bibliographie |
| Title: | Characterisation of SiO2 deposition by low-temperature plasma and photo CVD using low-frequency noise measurements |
| Language: | English |
| Date: | 1 January 1995 |
| Series: | International Conference on Noise and 1/f Fluctuations: ICNF '95 <1995, Palanga, Litauen>: Proceedings. S. 599 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Microwave Electronics |
| Date Deposited: | 19 Nov 2008 15:58 |
| Last Modified: | 14 Feb 2019 10:48 |
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