Endres, Ralf ; Schwalke, Udo (2007)
Damascene Metal Gate Technology: A Novel Approach towards Nano CMOS Devices with Crystalline High-K Gate Dielectrics.
Nanotech Northern Europe (NTNE). Helsinki, Finnland (27.-29.03.2007)
Conference or Workshop Item, Bibliographie
| Item Type: | Conference or Workshop Item |
|---|---|
| Erschienen: | 2007 |
| Creators: | Endres, Ralf ; Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Damascene Metal Gate Technology: A Novel Approach towards Nano CMOS Devices with Crystalline High-K Gate Dielectrics |
| Language: | English |
| Date: | 29 March 2007 |
| Event Title: | Nanotech Northern Europe (NTNE) |
| Event Location: | Helsinki, Finnland |
| Event Dates: | 27.-29.03.2007 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 20 Nov 2008 08:28 |
| Last Modified: | 05 Mar 2013 09:15 |
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