Endres, Ralf ; Schwalke, Udo (2007)
Damascene Metal Gate Technology: A Front-End CMP Based Universal Platform for High-k Evaluation at the Device Level.
In: Proceedings of the International Conference on Planarization Technology 2007 (ICPT)
Article, Bibliographie
| Item Type: | Article |
|---|---|
| Erschienen: | 2007 |
| Creators: | Endres, Ralf ; Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Damascene Metal Gate Technology: A Front-End CMP Based Universal Platform for High-k Evaluation at the Device Level |
| Language: | English |
| Date: | 26 October 2007 |
| Journal or Publication Title: | Proceedings of the International Conference on Planarization Technology 2007 (ICPT) |
| URL / URN: | http://elib1.ulb.tu-darmstadt.de/ieee/search/srchabstract.js... |
| Additional Information: | International Conference on Planarization Technology (ICPT), Dresden, Deutschland, 25.-26.10.2007 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 20 Nov 2008 08:28 |
| Last Modified: | 08 May 2024 08:52 |
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