Komaragiri, Rama Subrahmanyam ; Zaunert, Florian ; Schwalke, Udo (2004)
Gate Engineering for High-K Dielectric and Ultra-thin Gate Oxide CMOS.
11th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE). Veldhoven, Niederlande (24.-25.11.2004)
Conference or Workshop Item, Bibliographie
| Item Type: | Conference or Workshop Item |
|---|---|
| Erschienen: | 2004 |
| Creators: | Komaragiri, Rama Subrahmanyam ; Zaunert, Florian ; Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Gate Engineering for High-K Dielectric and Ultra-thin Gate Oxide CMOS |
| Language: | English |
| Date: | 25 November 2004 |
| Event Title: | 11th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE) |
| Event Location: | Veldhoven, Niederlande |
| Event Dates: | 24.-25.11.2004 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 20 Nov 2008 08:24 |
| Last Modified: | 05 Mar 2013 09:10 |
| PPN: | |
| Export: | |
| Suche nach Titel in: | TUfind oder in Google |
 |
Send an inquiry |
Options (only for editors)
 |
Show editorial Details |
Drucken
Impressum