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Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry

Stelzner, Thomas ; Arold, M. ; Falk, F. ; Stafast, Herbert ; Probst, Daniel ; Hoche, Holger (2005)
Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry.
In: Surface & coatings technology, 200
Article, Bibliographie

Item Type: Article
Erschienen: 2005
Creators: Stelzner, Thomas ; Arold, M. ; Falk, F. ; Stafast, Herbert ; Probst, Daniel ; Hoche, Holger
Type of entry: Bibliographie
Title: Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry
Language: English
Date: 2005
Journal or Publication Title: Surface & coatings technology
Volume of the journal: 200
Divisions: 11 Department of Materials and Earth Sciences
Date Deposited: 20 Nov 2008 08:23
Last Modified: 20 Feb 2020 13:25
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