Stelzner, Thomas ; Arold, M. ; Falk, F. ; Stafast, Herbert ; Probst, Daniel ; Hoche, Holger (2005)
Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry.
In: Surface & coatings technology, 200
Article, Bibliographie
Item Type: | Article |
---|---|
Erschienen: | 2005 |
Creators: | Stelzner, Thomas ; Arold, M. ; Falk, F. ; Stafast, Herbert ; Probst, Daniel ; Hoche, Holger |
Type of entry: | Bibliographie |
Title: | Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry |
Language: | English |
Date: | 2005 |
Journal or Publication Title: | Surface & coatings technology |
Volume of the journal: | 200 |
Divisions: | 11 Department of Materials and Earth Sciences |
Date Deposited: | 20 Nov 2008 08:23 |
Last Modified: | 20 Feb 2020 13:25 |
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