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Hard silicon carbonitride films obtained by RF-plasma enhanced chemical vapour deposition using the single source precursor Bis(trimethylsilyl)-carbodiimide

Zhou, Yanping ; Probst, Daniel ; Thissen, Andreas ; Kroke, Edwin ; Riedel, Ralf ; Hauser, Ralf ; Hoche, Holger ; Broszeit, Erhard ; Kroll, Peter ; Stafast, Herbert (2005)
Hard silicon carbonitride films obtained by RF-plasma enhanced chemical vapour deposition using the single source precursor Bis(trimethylsilyl)-carbodiimide.
In: Journal of the European Ceramic Society, 26
Article, Bibliographie

Item Type: Article
Erschienen: 2005
Creators: Zhou, Yanping ; Probst, Daniel ; Thissen, Andreas ; Kroke, Edwin ; Riedel, Ralf ; Hauser, Ralf ; Hoche, Holger ; Broszeit, Erhard ; Kroll, Peter ; Stafast, Herbert
Type of entry: Bibliographie
Title: Hard silicon carbonitride films obtained by RF-plasma enhanced chemical vapour deposition using the single source precursor Bis(trimethylsilyl)-carbodiimide
Language: English
Date: 2005
Journal or Publication Title: Journal of the European Ceramic Society
Volume of the journal: 26
Divisions: 11 Department of Materials and Earth Sciences
Date Deposited: 20 Nov 2008 08:22
Last Modified: 20 Feb 2020 13:25
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