Zhou, Yanping ; Probst, Daniel ; Thissen, Andreas ; Kroke, Edwin ; Riedel, Ralf ; Hauser, Ralf ; Hoche, Holger ; Broszeit, Erhard ; Kroll, Peter ; Stafast, Herbert (2005)
Hard silicon carbonitride films obtained by RF-plasma enhanced chemical vapour deposition using the single source precursor Bis(trimethylsilyl)-carbodiimide.
In: Journal of the European Ceramic Society, 26
Article, Bibliographie
Item Type: | Article |
---|---|
Erschienen: | 2005 |
Creators: | Zhou, Yanping ; Probst, Daniel ; Thissen, Andreas ; Kroke, Edwin ; Riedel, Ralf ; Hauser, Ralf ; Hoche, Holger ; Broszeit, Erhard ; Kroll, Peter ; Stafast, Herbert |
Type of entry: | Bibliographie |
Title: | Hard silicon carbonitride films obtained by RF-plasma enhanced chemical vapour deposition using the single source precursor Bis(trimethylsilyl)-carbodiimide |
Language: | English |
Date: | 2005 |
Journal or Publication Title: | Journal of the European Ceramic Society |
Volume of the journal: | 26 |
Divisions: | 11 Department of Materials and Earth Sciences |
Date Deposited: | 20 Nov 2008 08:22 |
Last Modified: | 20 Feb 2020 13:25 |
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