Schwalke, Udo ; Stefanov, Yordan (2004)
Process Integration and Electrical Characterization of Crystalline High-K Gate Dielectrics.
13th Workshop on Dielectrics in Microelectronics (WoDIM). Kinsale, Irland (28.-30.06.2004)
Conference or Workshop Item, Bibliographie
| Item Type: | Conference or Workshop Item |
|---|---|
| Erschienen: | 2004 |
| Creators: | Schwalke, Udo ; Stefanov, Yordan |
| Type of entry: | Bibliographie |
| Title: | Process Integration and Electrical Characterization of Crystalline High-K Gate Dielectrics |
| Language: | English |
| Date: | 30 June 2004 |
| Publisher: | Elsevier |
| Event Title: | 13th Workshop on Dielectrics in Microelectronics (WoDIM) |
| Event Location: | Kinsale, Irland |
| Event Dates: | 28.-30.06.2004 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 20 Nov 2008 08:20 |
| Last Modified: | 05 Mar 2013 09:04 |
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