Schwalke, Udo ; Stefanov, Yordan (2005)
Process Integration and Nanometer-Scale Electrical Characterization of Crystalline High-k Gate Dielectrics.
In: Microelectronics Reliability, 45 (5-6)
Article, Bibliographie
| Item Type: | Article |
|---|---|
| Erschienen: | 2005 |
| Creators: | Schwalke, Udo ; Stefanov, Yordan |
| Type of entry: | Bibliographie |
| Title: | Process Integration and Nanometer-Scale Electrical Characterization of Crystalline High-k Gate Dielectrics |
| Language: | English |
| Date: | 2005 |
| Journal or Publication Title: | Microelectronics Reliability |
| Volume of the journal: | 45 |
| Issue Number: | 5-6 |
| URL / URN: | http://dx.doi.org/10.1016/j.microrel.2004.11.047 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 20 Nov 2008 08:19 |
| Last Modified: | 20 Feb 2020 13:25 |
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