Kerber, Andreas ; Cartier, E. ; Degraeve, R. ; Roussel, Ph. ; Pantisano, L. ; Kauerauf, T. ; Groeseneken, G. ; Maes, H. E. ; Schwalke, Udo (2003)
Charge Trapping and Dielectric Reliability of SiO2/Al2O3 Gate Stacks with TiN Electrodes.
In: IEEE Transactions on Electron Devices, 50 (5)
Article, Bibliographie
URL / URN: http://dx.doi.org/10.1109/TED.2003.813486
| Item Type: | Article |
|---|---|
| Erschienen: | 2003 |
| Creators: | Kerber, Andreas ; Cartier, E. ; Degraeve, R. ; Roussel, Ph. ; Pantisano, L. ; Kauerauf, T. ; Groeseneken, G. ; Maes, H. E. ; Schwalke, Udo |
| Type of entry: | Bibliographie |
| Title: | Charge Trapping and Dielectric Reliability of SiO2/Al2O3 Gate Stacks with TiN Electrodes |
| Language: | English |
| Date: | May 2003 |
| Journal or Publication Title: | IEEE Transactions on Electron Devices |
| Volume of the journal: | 50 |
| Issue Number: | 5 |
| URL / URN: | http://dx.doi.org/10.1109/TED.2003.813486 |
| Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
| Date Deposited: | 20 Nov 2008 08:15 |
| Last Modified: | 20 Feb 2020 13:25 |
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