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Quantitative atomic order characterization of a Mn₂FeAl Heusler epitaxial thin film

Kurdi, Samer ; Sakuraba, Yuya ; Masuda, Keisuke ; Tajiri, Hiroo ; Nair, Bhaskaran ; Nataf, Guillaume F. ; Vickers, Mary E. ; Reiss, Günter ; Meinert, Markus ; Dhesi, Sarnjeet S. ; Ghidini, Massimo ; Barber, Zoe H. (2022)
Quantitative atomic order characterization of a Mn₂FeAl Heusler epitaxial thin film.
In: Journal of Physics D: Applied Physics, 55 (18)
doi: 10.1088/1361-6463/ac4e32
Article, Bibliographie

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Abstract

In this work, we investigate the effect of anti-site disorder on the half-metallic properties of a Mn₂FeAl Heusler alloy thin film. The film was grown on TiN-buffered MgO 001 substrates via magnetron sputtering. A detailed structural characterization using x-ray diffraction (XRD) and anomalous XRD showed that the film crystallizes in the partially disordered L2₁ B structure with 33% disorder between the Mn(B) and Al(D) sites. We measure a positive anisotropic magnetoresistance in the film, which is an indication of non-half metallic behaviour. Our x-ray magnetic circular dichroism sum rules analysis shows that Mn carries the magnetic moment in the film, with a positive Fe moment. Experimentally determined moments correspond most closely with those found by density functional calculated for the L2₁ B structure with Mn(B) and Al(D) site disorder, matching the experimental structural analysis. We thus attribute the deviation from half-metallic behaviour to the formation of the L2₁ B structure. To realize a half-metallic Mn₂FeAl film it is important that the inverse Heusler XA structure is stabilized with minimal anti-site atomic disorder.

Item Type: Article
Erschienen: 2022
Creators: Kurdi, Samer ; Sakuraba, Yuya ; Masuda, Keisuke ; Tajiri, Hiroo ; Nair, Bhaskaran ; Nataf, Guillaume F. ; Vickers, Mary E. ; Reiss, Günter ; Meinert, Markus ; Dhesi, Sarnjeet S. ; Ghidini, Massimo ; Barber, Zoe H.
Type of entry: Bibliographie
Title: Quantitative atomic order characterization of a Mn₂FeAl Heusler epitaxial thin film
Language: English
Date: 2022
Place of Publication: Darmstadt
Publisher: IOP Publishing
Journal or Publication Title: Journal of Physics D: Applied Physics
Volume of the journal: 55
Issue Number: 18
Collation: 10 Seiten
DOI: 10.1088/1361-6463/ac4e32
Corresponding Links:
Abstract:

In this work, we investigate the effect of anti-site disorder on the half-metallic properties of a Mn₂FeAl Heusler alloy thin film. The film was grown on TiN-buffered MgO 001 substrates via magnetron sputtering. A detailed structural characterization using x-ray diffraction (XRD) and anomalous XRD showed that the film crystallizes in the partially disordered L2₁ B structure with 33% disorder between the Mn(B) and Al(D) sites. We measure a positive anisotropic magnetoresistance in the film, which is an indication of non-half metallic behaviour. Our x-ray magnetic circular dichroism sum rules analysis shows that Mn carries the magnetic moment in the film, with a positive Fe moment. Experimentally determined moments correspond most closely with those found by density functional calculated for the L2₁ B structure with Mn(B) and Al(D) site disorder, matching the experimental structural analysis. We thus attribute the deviation from half-metallic behaviour to the formation of the L2₁ B structure. To realize a half-metallic Mn₂FeAl film it is important that the inverse Heusler XA structure is stabilized with minimal anti-site atomic disorder.

Uncontrolled Keywords: Heusler alloy, spintronics, x-ray absorption spectroscopy, x-ray diffraction, x-ray magnetic circular dichroism, spin polarization, thin films
Classification DDC: 500 Science and mathematics > 530 Physics
500 Science and mathematics > 540 Chemistry
600 Technology, medicine, applied sciences > 620 Engineering and machine engineering
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Microwave Engineering and Photonics (IMP)
18 Department of Electrical Engineering and Information Technology > Institute for Microwave Engineering and Photonics (IMP) > New Materials Electronics
Date Deposited: 02 Aug 2024 12:42
Last Modified: 02 Aug 2024 12:42
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