Eichhorn, Anna L. ; Hoffer, Marvin ; Bitsch, Katharina ; Dietz, Christian (2023)
Adsorbate formation/removal and plasma‐induced evolution of defects in graphitic materials.
In: Advanced Materials Interfaces, 10 (21)
doi: 10.1002/admi.202300256
Article, Bibliographie
This is the latest version of this item.
Abstract
The preparation of adsorbate‐free graphene with well‐defined layer numbers is a current challenge in materials and surface science and required to fabricate graphene‐based nanodevices, such as used in nanoelectromechanical systems. One strategy to tailor the layer number is oxygen‐plasma treatment of few‐layer graphene/graphite flakes. However, when graphitic materials are stored in air under ambient conditions, it is almost inevitable that adsorbates deposit on their surfaces. When precisely removing individual graphene layers from graphitic flakes by oxygen‐plasma treatment, the amount and type of adsorbates strongly affect the required plasma‐treatment process and duration. To examine the removal/etching mechanism involved in removing such layers, few‐layer graphene/graphite flakes, with areas of different layer numbers, are stored in ambient air and stepwise exposed to oxygen plasma in a shielded configuration. The flakes are then successively analyzed by multifrequency atomic force microscopy together with Raman spectroscopy, focusing on etching rate, and adsorbate and defect evolution. Combined in‐plane and out‐of‐plane tip–adsorbate–substrate interaction analysis facilitates discrimination of different types of adsorbates (water, polycyclic aromatic hydrocarbons, and linear alkanes) and their formation with time. The results demonstrate the potential regarding the development of an efficient method for cleaning of graphitic surfaces and ablation of individual graphene layers.
| Item Type: | Article |
|---|---|
| Erschienen: | 2023 |
| Creators: | Eichhorn, Anna L. ; Hoffer, Marvin ; Bitsch, Katharina ; Dietz, Christian |
| Type of entry: | Bibliographie |
| Title: | Adsorbate formation/removal and plasma‐induced evolution of defects in graphitic materials |
| Language: | English |
| Date: | 26 July 2023 |
| Place of Publication: | Weinheim |
| Publisher: | Wiley-VCH |
| Journal or Publication Title: | Advanced Materials Interfaces |
| Volume of the journal: | 10 |
| Issue Number: | 21 |
| Collation: | 12 Seiten |
| DOI: | 10.1002/admi.202300256 |
| Corresponding Links: | |
| Abstract: | The preparation of adsorbate‐free graphene with well‐defined layer numbers is a current challenge in materials and surface science and required to fabricate graphene‐based nanodevices, such as used in nanoelectromechanical systems. One strategy to tailor the layer number is oxygen‐plasma treatment of few‐layer graphene/graphite flakes. However, when graphitic materials are stored in air under ambient conditions, it is almost inevitable that adsorbates deposit on their surfaces. When precisely removing individual graphene layers from graphitic flakes by oxygen‐plasma treatment, the amount and type of adsorbates strongly affect the required plasma‐treatment process and duration. To examine the removal/etching mechanism involved in removing such layers, few‐layer graphene/graphite flakes, with areas of different layer numbers, are stored in ambient air and stepwise exposed to oxygen plasma in a shielded configuration. The flakes are then successively analyzed by multifrequency atomic force microscopy together with Raman spectroscopy, focusing on etching rate, and adsorbate and defect evolution. Combined in‐plane and out‐of‐plane tip–adsorbate–substrate interaction analysis facilitates discrimination of different types of adsorbates (water, polycyclic aromatic hydrocarbons, and linear alkanes) and their formation with time. The results demonstrate the potential regarding the development of an efficient method for cleaning of graphitic surfaces and ablation of individual graphene layers. |
| Uncontrolled Keywords: | adsorbates, graphene, in‐plane and out‐of‐plane mechanical properties, multifrequency atomic force microscopy, plasma treatment |
| Identification Number: | 2300256 |
| Additional Information: | Artikel-ID: 2300256 |
| Classification DDC: | 500 Science and mathematics > 530 Physics |
| Divisions: | 11 Department of Materials and Earth Sciences 11 Department of Materials and Earth Sciences > Material Science 11 Department of Materials and Earth Sciences > Material Science > Physics of Surfaces |
| Date Deposited: | 24 Jan 2024 07:04 |
| Last Modified: | 24 Jan 2024 09:50 |
| PPN: | 514946229 |
| Export: | |
| Suche nach Titel in: | TUfind oder in Google |
Available Versions of this Item
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Adsorbate Formation/Removal and Plasma‐Induced Evolution of Defects in Graphitic Materials. (deposited 23 Jan 2024 10:41)
- Adsorbate formation/removal and plasma‐induced evolution of defects in graphitic materials. (deposited 24 Jan 2024 07:04) [Currently Displayed]
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