Niedermayer, Uwe ; Lautenschläger, Jan ; Egenolf, Thilo ; Boine-Frankenheim, Oliver (2021)
Design of a Scalable Integrated Nanophotonic Electron Accelerator on a Chip.
In: Physical Review Applied, 16 (2)
doi: 10.1103/physrevapplied.16.024022
Article, Bibliographie
Abstract
A simple way of implementing a scalable laser-driven nanophotonic electron accelerator on a chip is presented. The design requires only a single incident laser pulse and can be fabricated straightforwardly on commercial silicon-on-insulator wafers. We investigate the low-energy regime of tabletop electron microscopes where the silicon structures safely allow peak gradients of about 150 MeV/m. By means of a three-dimensional alternating-phase-focusing scheme, we obtain about half of the peak gradient as the average gradient with six-dimensional confinement and full-length scalability. The structures are completely designed within the device layer of the wafer and can be arranged in stages. We choose the stages as energy doublers and outline how errors in the handshake between the stages can be corrected by on-chip steerers. Since the electron pulse length in the attosecond realm is preserved, our chip is the ideal energy booster for ultrafast-electron-diffraction machines, opening the megaelectronvolt scale on tabletop setups.
Item Type: | Article |
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Erschienen: | 2021 |
Creators: | Niedermayer, Uwe ; Lautenschläger, Jan ; Egenolf, Thilo ; Boine-Frankenheim, Oliver |
Type of entry: | Bibliographie |
Title: | Design of a Scalable Integrated Nanophotonic Electron Accelerator on a Chip |
Language: | English |
Date: | 12 August 2021 |
Publisher: | APS Publishing |
Journal or Publication Title: | Physical Review Applied |
Volume of the journal: | 16 |
Issue Number: | 2 |
DOI: | 10.1103/physrevapplied.16.024022 |
Abstract: | A simple way of implementing a scalable laser-driven nanophotonic electron accelerator on a chip is presented. The design requires only a single incident laser pulse and can be fabricated straightforwardly on commercial silicon-on-insulator wafers. We investigate the low-energy regime of tabletop electron microscopes where the silicon structures safely allow peak gradients of about 150 MeV/m. By means of a three-dimensional alternating-phase-focusing scheme, we obtain about half of the peak gradient as the average gradient with six-dimensional confinement and full-length scalability. The structures are completely designed within the device layer of the wafer and can be arranged in stages. We choose the stages as energy doublers and outline how errors in the handshake between the stages can be corrected by on-chip steerers. Since the electron pulse length in the attosecond realm is preserved, our chip is the ideal energy booster for ultrafast-electron-diffraction machines, opening the megaelectronvolt scale on tabletop setups. |
Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Accelerator Science and Electromagnetic Fields > Accelerator Physics 18 Department of Electrical Engineering and Information Technology > Institute for Accelerator Science and Electromagnetic Fields |
Date Deposited: | 16 Feb 2023 09:53 |
Last Modified: | 15 Jun 2023 09:04 |
PPN: | 508616646 |
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