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Projection objective

Walser, Reinhold ; Schicketanz, Thomas (2014):
Projection objective.
Oberkochen, Carl Zeiss SMT GmbH, US 8,902,406,
[Norm, patent, standard]

Item Type: Norm, patent, standard
Erschienen: 2014
Creators: Walser, Reinhold ; Schicketanz, Thomas
Title: Projection objective
Language: English
Place of Publication: Oberkochen
Country: United States of America
Patent number: US 8,902,406
Divisions: 05 Department of Physics
05 Department of Physics > Institute of Applied Physics
05 Department of Physics > Institute of Applied Physics > Theorie kalter Quantengase, Quantenoptik, Technische Optik
05 Department of Physics > Institute of Applied Physics > Theoretische Quantendynamik
05 Department of Physics > Institute of Applied Physics > Theoretical Quantum Physics Group
Date Deposited: 15 Jun 2021 06:55
Additional Information:

Searchable via Untied States Patent and Trademark Office

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A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the object plane and the image plane. At least one of the mirrors includes a graded reflective coating with a rotationally-asymmetric coating thickness profile in the mirror plane on a substrate with a rotationally-asymmetric or rotationally-symmetric surface profile. The projection objective can exhibit increased overall transmission.

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