Noll, Dennis ; Schwalke, Udo (2015)
Silicon CMOS Compatible In-situ CCVD Growth of Graphene on Silicon Nitride.
10th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS). Naples, Italy (21.-23.04.2015)
doi: 10.1109/DTIS.2015.7127387
Conference or Workshop Item, Bibliographie
Item Type: | Conference or Workshop Item |
---|---|
Erschienen: | 2015 |
Creators: | Noll, Dennis ; Schwalke, Udo |
Type of entry: | Bibliographie |
Title: | Silicon CMOS Compatible In-situ CCVD Growth of Graphene on Silicon Nitride |
Language: | English |
Date: | April 2015 |
Place of Publication: | Naples, Italy |
Event Title: | 10th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS) |
Event Location: | Naples, Italy |
Event Dates: | 21.-23.04.2015 |
DOI: | 10.1109/DTIS.2015.7127387 |
Divisions: | 18 Department of Electrical Engineering and Information Technology 18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics |
Date Deposited: | 30 Jul 2019 09:33 |
Last Modified: | 30 Jul 2019 09:33 |
PPN: | |
Export: | |
Suche nach Titel in: | TUfind oder in Google |
Send an inquiry |
Options (only for editors)
Show editorial Details |