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Silicon CMOS Compatible In-situ CCVD Growth of Graphene on Silicon Nitride

Noll, Dennis ; Schwalke, Udo (2015)
Silicon CMOS Compatible In-situ CCVD Growth of Graphene on Silicon Nitride.
10th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS). Naples, Italy (21.-23.04.2015)
doi: 10.1109/DTIS.2015.7127387
Conference or Workshop Item, Bibliographie

Item Type: Conference or Workshop Item
Erschienen: 2015
Creators: Noll, Dennis ; Schwalke, Udo
Type of entry: Bibliographie
Title: Silicon CMOS Compatible In-situ CCVD Growth of Graphene on Silicon Nitride
Language: English
Date: April 2015
Place of Publication: Naples, Italy
Event Title: 10th International Conference on Design and Technology of Integrated Systems in Nanoscale Era (DTIS)
Event Location: Naples, Italy
Event Dates: 21.-23.04.2015
DOI: 10.1109/DTIS.2015.7127387
Divisions: 18 Department of Electrical Engineering and Information Technology
18 Department of Electrical Engineering and Information Technology > Institute for Semiconductor Technology and Nano-Electronics
Date Deposited: 30 Jul 2019 09:33
Last Modified: 30 Jul 2019 09:33
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