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Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation

Lebedev, Mikhail V. and Kalyuzhnyy, Nikolay A. and Mintairov, Sergey A. and Calvet, Wolfram and Kaiser, Bernhard and Jaegermann, Wolfram (2016):
Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation.
In: Materials Science in Semiconductor Processing, 51pp. 81-88, ISSN 13698001,
[Online-Edition: http://dx.doi.org/10.1016/j.mssp.2016.05.005],
[Article]

Item Type: Article
Erschienen: 2016
Creators: Lebedev, Mikhail V. and Kalyuzhnyy, Nikolay A. and Mintairov, Sergey A. and Calvet, Wolfram and Kaiser, Bernhard and Jaegermann, Wolfram
Title: Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation
Language: English
Journal or Publication Title: Materials Science in Semiconductor Processing
Volume: 51
Divisions: 11 Department of Materials and Earth Sciences > Material Science
11 Department of Materials and Earth Sciences > Material Science > Surface Science
11 Department of Materials and Earth Sciences
Date Deposited: 13 Dec 2016 15:12
Official URL: http://dx.doi.org/10.1016/j.mssp.2016.05.005
Identification Number: doi:10.1016/j.mssp.2016.05.005
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